Methacrylic Acid

Methacrylic Acid

SCHEMBL28013263

C=C(C)C(=O)O.C=CC(=O)OC(C)CN=C=O

nearest known ligand 0.34

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Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2830959 0.91 TSHR (0.40) TSHR
Succinic Acid SCHEMBL28005011 0.87 TSHR (0.35) TSHR
Maleic Acid SCHEMBL27997600 0.87 HCAR2 (0.40) TSHR
SCHEMBL28182877 0.86 TSHR (0.37) TSHR
Phosphoric Acid SCHEMBL27981627 0.85 TSHR (0.36) TSHR
Methacrylic Acid SCHEMBL28204338 0.83 TSHR (0.37) TSHR
Phthalic Acid SCHEMBL28015772 0.80 ALDH1A1 (0.40)
SCHEMBL28015770 0.80 TAAR1 (0.32) TSHR
SCHEMBL322300 0.78 TSHR (0.40) TSHR
Phenylphosphonic Acid SCHEMBL28051547 0.78 CA2 (0.39) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101495919-B Positive photosensitive resin composition, method for preparing cured relief pattern, semiconductor device ASAHI KASEI E MATERIALS CORP 2015-05-06 CN disclosed