Hydrochloric Acid

Hydrochloric Acid

SCHEMBL28019190

CC(C(=O)O)[n+]1ccn(C)c1.[Cl-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13822426 0.98
Bromide SCHEMBL28377463 0.96 ALDH1A1 (0.30)
SCHEMBL28896401 0.91
SCHEMBL27897182 0.91
Sulfuric Acid SCHEMBL28435461 0.91
Sulfuric Acid SCHEMBL28435462 0.90
SCHEMBL28072435 0.90 MEN1 (0.30)
Sulfuric Acid SCHEMBL28122789 0.88
Hydrochloric Acid SCHEMBL28438403 0.79 LMNA (0.34)
Bicarbonate SCHEMBL28687620 0.77 KDM4E (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111435705-B Repairing agent and repairing method thereof and method for preparing photoelectric film 杭州纤纳光电科技有限公司 2023-04-07 CN claimed
CN-114836168-A Organosilicon pouring sealant modified by anions and cations and preparation method thereof 合肥工业大学 2022-08-02 CN claimed
CN-113392571-B Method for simulating structural characteristics of interlayer graphene oxide/binary ionic liquid lubricating film through molecular dynamics 湘潭大学 2022-05-31 CN claimed
CN-110451454-B Cross-scale friction-reducing wear-resisting modification method and characterization method for monocrystalline silicon surface 湘潭大学 2022-04-22 CN claimed
CN-111974318-B Composite defective metal organic framework gel proton conducting material and preparation method thereof 哈尔滨师范大学 2022-03-22 CN claimed
CN-113392571-A Method for simulating structural characteristics of interlayer graphene oxide/binary ionic liquid lubricating film through molecular dynamics 湘潭大学 2021-09-14 CN claimed
CN-109448798-B Method for simulating structural characteristics of binary doped ionic liquid lubricating film by molecular dynamics 湘潭大学 2021-09-03 CN claimed
CN-112086564-A Passivating agent and passivation method thereof and method for preparing semiconductor film 杭州纤纳光电科技有限公司 2020-12-15 CN claimed
CN-111974318-A Composite defective metal organic framework gel proton conducting material and preparation method thereof 哈尔滨师范大学 2020-11-24 CN claimed
CN-108525656-B Micron-pattern composite catalyst for oxidizing phenol into p-benzoquinone and application thereof 扬州工业职业技术学院 2020-07-24 CN claimed
CN-111435705-A Repairing agent and repairing method thereof and method for preparing photoelectric film 杭州纤纳光电科技有限公司 2020-07-21 CN claimed
CN-111435705-B Repairing agent and repairing method thereof and method for preparing photoelectric film 杭州纤纳光电科技有限公司 2023-04-07 CN disclosed
CN-114836168-A Organosilicon pouring sealant modified by anions and cations and preparation method thereof 合肥工业大学 2022-08-02 CN disclosed
CN-114762736-A Ionic liquid modified chitosan hydrogel and preparation method and application thereof 中国科学院宁波材料技术与工程研究所慈溪生物医学工程研究所 2022-07-19 CN disclosed
CN-113392571-B Method for simulating structural characteristics of interlayer graphene oxide/binary ionic liquid lubricating film through molecular dynamics 湘潭大学 2022-05-31 CN disclosed
CN-111974318-A Composite defective metal organic framework gel proton conducting material and preparation method thereof 哈尔滨师范大学 2020-11-24 CN disclosed
CN-111943203-A Preparation method and application of vacancy manganese-based MAX 郑州轻工业大学 2020-11-17 CN disclosed
CN-111435705-A Repairing agent and repairing method thereof and method for preparing photoelectric film 杭州纤纳光电科技有限公司 2020-07-21 CN disclosed
CN-111151295-A Surface modified composite carbon material for oxidative desulfurization and preparation method thereof 华南理工大学 2020-05-15 CN disclosed
CN-104610357-A Preparation method for sodium zoledronic acid UNIV HENAN NORMAL 2015-05-13 CN disclosed