SCHEMBL28023922

SCHEMBL28023922

FC(F)F.Oc1ccc(CSCc2ccccc2)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.49
FNTA P49354 1/20 0.47
FNTB P49356 1/20 0.47
CYP2C19 P33261 2/20 0.44
LMNA P02545 1/20 0.42
CYP1A2 P05177 1/20 0.42
PTGS1 P23219 1/20 0.42
SLC6A2 P23975 1/20 0.42
PTGS2 P35354 1/20 0.42
SLC6A3 Q01959 1/20 0.42
HIF1A Q16665 1/20 0.42
HDAC6 Q9UBN7 1/20 0.42
NPC1 O15118 1/20 0.41
OPRK1 P41145 1/20 0.40
NOS3 P29474 1/20 0.39
NOS1 P29475 1/20 0.39
NOS2 P35228 1/20 0.39
ESR1 P03372 2/20 0.39
ESR2 Q92731 2/20 0.39
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL760351 0.92 IDO1 (0.55) IDO1FNTAFNTBCYP2C19LMNA
Hydrochloric Acid SCHEMBL31475280 0.90 IDO1 (0.53) IDO1FNTAFNTBCYP2C19LMNA
SCHEMBL27733361 0.87 CYP2C19 (0.48) IDO1CYP2C19CYP1A2NPC1NOS3
SCHEMBL27733608 0.86 IDO1 (0.47) IDO1FNTAFNTBCYP2C19LMNA
SCHEMBL27733612 0.86 IDO1 (0.47) IDO1FNTAFNTBCYP2C19LMNA
SCHEMBL63777 0.82 ESR1 (0.55) IDO1CYP2C19LMNASLC6A2HIF1A
SCHEMBL28023928 0.81 LMNA (0.47) CYP2C19LMNACYP1A2KDM4E
SCHEMBL31676929 0.80 ESR1 (0.52) IDO1CYP2C19LMNASLC6A2HIF1A
SCHEMBL20291443 0.79 IDO1 (0.49) IDO1FNTAFNTBCYP2C19LMNA
Trifluoromethanesulfonic Acid SCHEMBL20421983 0.79 IDO1 (0.45) IDO1FNTAFNTBCYP2C19LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110095941-A The manufacturing method of photosensitive polymer combination and semiconductor element 东丽株式会社 2019-08-06 CN disclosed
CN-108026253-A High-molecular compound, resin combination, film, solid photographic device, the manufacture method of high-molecular compound, the manufacture method of solid photographic device and optical device 东丽株式会社 2018-05-11 CN disclosed
CN-103180784-B Photosensitive composite, the cured film formed by it and there is the element of cured film TORAY INDUSTRIES, INC. (JP) 2016-01-20 CN disclosed
CN-102918460-B Photosensitive siloxane composition, cured film formed form same, and element having cured film TORAY INDUSTRIES 2015-07-22 CN disclosed