SCHEMBL760351

SCHEMBL760351

Oc1ccc(CSCc2ccccc2)cc1

nearest known ligand 0.81

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.55
FNTA P49354 1/20 0.54
FNTB P49356 1/20 0.54
CYP2C19 P33261 2/20 0.50
LMNA P02545 1/20 0.48
CYP1A2 P05177 1/20 0.48
PTGS1 P23219 1/20 0.48
SLC6A2 P23975 1/20 0.48
PTGS2 P35354 1/20 0.48
SLC6A3 Q01959 1/20 0.48
HIF1A Q16665 1/20 0.48
HDAC6 Q9UBN7 1/20 0.48
ESR1 P03372 2/20 0.46
ESR2 Q92731 2/20 0.46
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
GLA P06280 1/20 0.46
CA3 P07451 1/20 0.46
CA4 P22748 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL31475280 0.98 IDO1 (0.53) IDO1FNTAFNTBCYP2C19LMNA
SCHEMBL63777 0.90 ESR1 (0.55) IDO1CYP2C19LMNASLC6A2HIF1A
SCHEMBL31676929 0.87 ESR1 (0.52) IDO1CYP2C19LMNASLC6A2HIF1A
SCHEMBL20291443 0.87 IDO1 (0.49) IDO1FNTAFNTBCYP2C19LMNA
SCHEMBL28844819 0.86 IDO1 (0.55) IDO1FNTAFNTBCYP2C19LMNA
SCHEMBL206 0.84 CYP2C19 (0.56) IDO1CYP2C19CYP1A2CA12CA1
SCHEMBL31038955 0.84 SMN1; SMN2 (0.53) IDO1FNTAFNTBCYP2C19LMNA
Trifluoromethanesulfonic Acid SCHEMBL20421983 0.82 IDO1 (0.45) IDO1FNTAFNTBCYP2C19LMNA
Methyl Alcohol SCHEMBL29261078 0.82 CYP2C19 (0.56) IDO1CYP2C19LMNACYP1A2CA12
SCHEMBL7136112 0.82 CYP2C19 (0.54) IDO1CYP2C19CYP1A2CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 641 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119717396-A Photosensitive resin composition baked at low temperature and use thereof 台湾永光化学工业股份有限公司 2025-03-28 CN claimed
EP-1752463-B1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX SAN APRO LTD (JP) 2013-07-17 EP claimed
US-20040242818-A1 Deodorizing agent for sulfur-or nitrogen-containing initiators UCB, S.A. (BE) 2004-12-02 US claimed
EP-1438347-A1 DEODORIZING AGENT FOR SULFUR- OR NITROGEN-CONTAINING INITIATORS UCB, S.A. (BE) 2004-07-21 EP claimed
US-20030152862-A1 Deodorizing agent for sulfur- or nitrogen-containing initiators UCB, S. A. (BE) 2003-08-14 US claimed
US-20030108810-A1 Deodorizing agent for sulfur- or nitrogen-containing salt photoinitiators UCB, S.A. (BE) 2003-06-12 US claimed
WO-2003018663-A1 DEODORIZING AGENT FOR SULFUR- OR NITROGEN-CONTAINING INITIATORS UCB, S.A. (BE) 2003-03-06 WO claimed
EP-0331496-B1 POLYFLUORIDE SULFONIUM COMPOUNDS AND POLYMERIZATION INITIATOR THEREOF SANSHIN KAGAKU KOGYO CO., LTD. (JP) 1992-09-16 EP claimed
JP-2250836-A None JP disclosed
EP-3312211-B1 CURABLE COMPOSITION, ADHESIVE SHEET, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING ADHESIVE SHEET, AND DEVICE DAICEL CORP (JP) 2026-05-27 EP disclosed
US-20260139710-A1 BEARING DEVICE, METHOD OF MANUFACTURING BEARING DEVICE, HARD DISK DRIVE DEVICE, AND MOTOR MINEBEA MITSUMI INC (JP) 2026-05-21 US disclosed
WO-2026100367-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD 東京応化工業株式会社 2026-05-15 WO disclosed
US-12623999-B2 Carbamate production method, carbamate ester production method, and urea derivative production method NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2026-05-12 US disclosed
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
EP-1027190-A1 COATED ABRASIVE PRODUCTS UCB, S.A. (BE) 2000-08-16 EP disclosed
WO-1998032566-A1 COATED ABRASIVE PRODUCTS UCB, S.A. (BE) 1998-07-30 WO disclosed
US-5730764-A BLEND OF CURABLE EPOXY RESIN AND ONIUM SALT SURFACE SPECIALTIES, S.A. (BE) 1998-03-24 US disclosed
CN-1158497-A Semiconductor packaging method TAIWAN GENERAL APPTS AND APPLI (CN) 1997-09-03 CN disclosed
EP-0511405-A1 CATIONICALLY POLYMERIZABLE ORGANIC MATERIAL COMPOSITION AND STABILIZATION OF SAID COMPOSITION NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1992-11-04 EP disclosed
JP-H02250836-A BENZYLATING AGENT AND BENZYLATION OF THIOL SANSHIN CHEM IND CO LTD 1990-10-08 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260139710-A1 BEARING DEVICE, METHOD OF MANUFACTURING BEARING DEVICE, HARD DISK DRIVE DEVICE, AND MOTOR ZW10, SOD1, EED IDO1 3856/4885FNTA 3066/4885FNTB 2547/4885
US-12623999-B2 Carbamate production method, carbamate ester production method, and urea derivative production method CPS1, CA2, CHRM2 IDO1 3322/4885FNTA 3377/4885FNTB 654/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.