SCHEMBL28023928

SCHEMBL28023928

Cc1ccccc1CSCc1ccc(O)cc1.FC(F)F

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.47
MAPT P10636 4/20 0.47
KDM4E B2RXH2 1/20 0.47
ALDH1A1 P00352 5/20 0.44
CYP1A2 P05177 1/20 0.44
CYP3A4 P08684 1/20 0.44
CYP2D6 P10635 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
KEAP1 Q14145 1/20 0.42
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
GAA P10253 1/20 0.40
THRB P10828 1/20 0.40
HPGD P15428 2/20 0.40
HTT P42858 2/20 0.39
GLA P06280 1/20 0.39
DAO P14920 1/20 0.39
TDP1 Q9NUW8 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL758838 0.94 LMNA (0.51) LMNAMAPTKDM4EALDH1A1CYP1A2
SCHEMBL29634752 0.85 MAPT (0.51) LMNAMAPTKDM4EALDH1A1CYP1A2
Trifluoromethanesulfonic Acid SCHEMBL29479975 0.83 LMNA (0.44) LMNAMAPTKDM4EALDH1A1CYP1A2
SCHEMBL27818376 0.82 LMNA (0.55) LMNAMAPTKDM4EALDH1A1CYP1A2
SCHEMBL28023922 0.81 IDO1 (0.49) LMNAKDM4ECYP1A2CYP2C19
SCHEMBL31038959 0.80 LMNA (0.47) LMNAMAPTKDM4EALDH1A1CYP1A2
SCHEMBL28473257 0.80 KEAP1 (0.47) LMNAMAPTKDM4EALDH1A1CYP1A2
SCHEMBL28682455 0.79 LMNA (0.56) LMNAMAPTKDM4EALDH1A1CYP1A2
SCHEMBL777337 0.77 ALDH1A1 (0.56) LMNAMAPTALDH1A1CYP1A2CYP2C9
SCHEMBL15331810 0.76 MAPT (0.48) LMNAMAPTKDM4EALDH1A1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110095941-A The manufacturing method of photosensitive polymer combination and semiconductor element 东丽株式会社 2019-08-06 CN disclosed
CN-107077070-A The manufacture method of photosensitive polymer combination, cured film, the element for possessing cured film and semiconductor devices 东丽株式会社 2017-08-18 CN disclosed
CN-103180784-B Photosensitive composite, the cured film formed by it and there is the element of cured film TORAY INDUSTRIES, INC. (JP) 2016-01-20 CN disclosed
CN-102918460-B Photosensitive siloxane composition, cured film formed form same, and element having cured film TORAY INDUSTRIES 2015-07-22 CN disclosed