Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | F2 | P00734 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.43 |
| ▸ | CES2 | O00748 | 2/20 | 0.43 |
| ▸ | CES1 | P23141 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | HTR1A | P08908 | 1/20 | 0.43 |
| ▸ | SCN1A | P35498 | 1/20 | 0.43 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.43 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.43 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11850307 | 0.89 | LMNA (0.51) | LMNATSHRF2TDP1CYP2D6 | |
| SCHEMBL26892136 | 0.89 | ADRA2C (0.47) | LMNATSHRF2TDP1CYP2D6 | |
| SCHEMBL27851129 | 0.88 | LMNA (0.50) | LMNATSHRF2TDP1CES2 | |
| SCHEMBL4410632 | 0.87 | KMT2A (0.44) | LMNATSHRKMT2ASMN1; SMN2 | |
| SCHEMBL28429762 | 0.86 | CES2 (0.49) | LMNATSHRTDP1CES2CES1 | |
| SCHEMBL1730081 | 0.85 | LMNA (0.53) | LMNATSHRF2TDP1CYP2D6 | |
| SCHEMBL5678485 | 0.84 | LMNA (0.53) | LMNATSHRF2TDP1CYP2D6 | |
| Hydrochloric Acid SCHEMBL27431202 | 0.83 | LMNA (0.52) | LMNATSHRF2TDP1CYP2D6 | |
| SCHEMBL8604492 | 0.81 | LMNA (0.47) | LMNATSHRF2TDP1KMT2A | |
| Hydrochloric Acid SCHEMBL9134016 | 0.81 | LMNA (0.44) | LMNATSHRTDP1CYP2D6CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105607426-B | Polymer, chemical amplification negative resist composition and pattern forming method | SHIN ETSU CHEMICAL COMPANY (JP) | 2019-11-01 | — | — | CN | disclosed |
| CN-104330955-B | For the chemical-amplification positive anti-corrosion agent composition and patterning method of EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-05-25 | — | — | CN | disclosed |
| CN-104199255-B | Chemistry amplification negative resist composition and patterning method for EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-03-13 | — | — | CN | disclosed |
| CN-102243439-B | Chemically amplified positive resist composition for electron beam or extreme ultraviolet lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-16 | — | — | CN | disclosed |
| CN-102129172-B | The method of negative resist composition and formation pattern | SHIN-ETSU CHEMICAL INDUSTRY CO., LTD. (JP) | 2015-09-09 | — | — | CN | disclosed |
| CN-102321212-B | Polymkeric substance, chemical-amplification positive anti-corrosion agent composition and pattern formation method | SHIN-ETSU CHEMICAL INDUSTRY CO., LTD. (JP) | 2015-08-19 | — | — | CN | disclosed |
| CN-102096321-B | Negative resist composition and patterning process | SHINETSU CHEMICAL CO | 2015-05-13 | — | — | CN | disclosed |
| CN-104330955-A | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR EB OR EUV LITHOGRAPHY AND PATTERNING PROCESS | SHINETSU CHEMICAL CO | 2015-02-04 | — | — | CN | disclosed |
| CN-102221783-B | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO | 2015-01-28 | — | — | CN | disclosed |
| CN-102321212-A | Polymer, chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO | 2012-01-18 | — | — | CN | disclosed |