SCHEMBL28047971

SCHEMBL28047971

COc1cc(O)cc(OC)n1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.52
KDM4E B2RXH2 2/20 0.52
TDP1 Q9NUW8 3/20 0.47
LMNA P02545 2/20 0.47
CYP3A4 P08684 2/20 0.44
MAPT P10636 1/20 0.44
CYP1A2 P05177 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.40
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
PDE2A O00408 1/20 0.39
POLB P06746 2/20 0.38
ALOX5 P09917 1/20 0.38
PTGS2 P35354 1/20 0.38
TP53 P04637 1/20 0.38
MAPK1 P28482 1/20 0.38
CASP3 P42574 1/20 0.38
SENP8 Q96LD8 1/20 0.38
SENP7 Q9BQF6 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28210894 0.87 KDM4E (0.42) ALDH1A1KDM4ETDP1LMNACYP3A4
SCHEMBL17688038 0.85 LMNA (0.42) ALDH1A1KDM4ETDP1LMNACYP3A4
SCHEMBL21603204 0.85 ALDH1A1 (0.42) ALDH1A1KDM4ETDP1LMNACYP3A4
SCHEMBL29214462 0.84 ALDH1A1 (0.39) ALDH1A1KDM4ETDP1LMNACYP3A4
SCHEMBL401293 0.78 CYP1A2 (0.48) ALDH1A1KDM4ETDP1LMNACYP1A2
SCHEMBL29467540 0.77 ALDH1A1 (0.50) ALDH1A1KDM4ETDP1LMNAMAPT
SCHEMBL28506559 0.76 CYP1A2 (0.47) ALDH1A1KDM4ETDP1LMNACYP1A2
SCHEMBL3401912 0.74 ALDH1A1 (0.56) ALDH1A1KDM4ETDP1LMNACYP3A4
SCHEMBL11919886 0.74 ALDH1A1 (0.48) ALDH1A1KDM4ETDP1LMNACYP1A2
SCHEMBL4716253 0.74 ALDH1A1 (0.50) ALDH1A1KDM4ETDP1LMNACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105190439-B Modified novolac type phenolic resin, erosion resistant, film and permanent film against corrosion DIC株式会社 2019-05-17 CN disclosed
CN-107001550-B Novolak phenolics, its manufacturing method, photosensitive composite, erosion resistant and film DIC株式会社 2019-04-02 CN disclosed
CN-106458812-B Containing modified phenolic hydroxyl-compounds, the preparation method containing modified phenolic hydroxyl-compounds, photosensitive composite, protection materials and protection film DIC株式会社 2019-03-26 CN disclosed
CN-105555820-B Manufacturing method, photosensitive composite, erosion resistant and the film of modified hydroxyl naphthol novolak varnish gum, modified hydroxyl naphthol novolak varnish gum DIC株式会社 2018-06-29 CN disclosed
CN-107001550-A Novolak phenolics, its manufacture method, photosensitive composite, erosion resistant and film DIC株式会社 2017-08-01 CN disclosed
CN-107003612-A Resist lower membrane formation photosensitive composite and resist lower membrane DIC株式会社 2017-08-01 CN disclosed
CN-106458812-A Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film DIC株式会社 2017-02-22 CN disclosed
CN-105555820-A Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating DAINIPPON INK & CHEMICALS 2016-05-04 CN disclosed
CN-105254637-A PYRIMIDINE SUBSTITUTED MACROCYCLIC INHIBITORS JANSSEN R & D IRELAND 2016-01-20 CN disclosed
CN-105190439-A Modified phenolic novolac resin, resist material, coating film, and permanent resist film DAINIPPON INK &AMP 2015-12-23 CN disclosed