Hydrogen Sulfide

Hydrogen Sulfide

SCHEMBL28050678

FC(F)F.S.[BiH2]c1cccc(C2CCCCC2)c1C1CCCCC1

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ABCB1 P08183 2/20 0.36
PTGS2 P35354 1/20 0.34
FEN1 P39748 2/20 0.33
CEL P19835 2/20 0.33
PTGDR2 Q9Y5Y4 1/20 0.32
ALOX5AP P20292 1/20 0.32
HTR1A P08908 1/20 0.31
HTR7 P34969 1/20 0.31
TDO2 P48775 1/20 0.31
PTPN5 P54829 2/20 0.30
PTPN2 P17706 1/20 0.30
PDCD1 Q15116 1/20 0.30
CD274 Q9NZQ7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Sulfide SCHEMBL28029145 0.93 ABCB1 (0.37) ABCB1PTGS2CELPTGDR2HTR1A
SCHEMBL5736644 0.91 ABCB1 (0.38) ABCB1PTGS2CELPTGDR2HTR1A
SCHEMBL28118505 0.83 PTGDR2 (0.38) ABCB1PTGS2CELPTGDR2HTR1A
SCHEMBL28144019 0.82 ABCB1 (0.39) ABCB1PTGS2CELPTGDR2HTR1A
SCHEMBL239469 0.78 ABCB1 (0.43) ABCB1PTGS2CELPTGDR2HTR1A
SCHEMBL14353365 0.76 ABCB1 (0.42) ABCB1PTGS2CELPTGDR2HTR1A
SCHEMBL777873 0.75 CEL (0.41) ABCB1PTGS2CELPTGDR2HTR1A
SCHEMBL6351189 0.73 HTR1A (0.38) ABCB1PTGS2CELPTGDR2HTR1A
SCHEMBL5737525 0.73 HTR1A (0.38) ABCB1PTGS2CELPTGDR2HTR1A
Sulfuric Acid SCHEMBL15345296 0.72 PTGS2 (0.40) ABCB1PTGS2FEN1CELPTGDR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110297398-A Photosensitve resin composition, photosensitive resin lamilate and pattern forming method 信越化学工业株式会社 2019-10-01 CN disclosed
CN-108388082-A Photosensitive polymer combination, photosensitive dry film, photosensitive resin coating and pattern forming method 信越化学工业株式会社 2018-08-10 CN disclosed
CN-105487337-A Chemically amplified negative resist composition, photo-curable dry film, making method, patterning process, and electric/electronic part-protecting film SHINETSU CHEMICAL CO 2016-04-13 CN disclosed
CN-105315467-A Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, and patterning process SHINETSU CHEMICAL CO 2016-02-10 CN disclosed
CN-102428151-B Mix composition and the method for photocatalyst THE PROCTER & GAMBLE CO. (US) 2015-11-25 CN disclosed
CN-102648255-B Compositions and methods incorporating photocatalysts PROCTER & GAMBLE 2015-04-15 CN disclosed