SCHEMBL28056536

SCHEMBL28056536

CC(c1cccc2ccccc12)C(F)(F)F.CC[Si](C)(Cl)Cl

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2C P18825 6/20 0.40
SLC6A4 P31645 3/20 0.40
CASR P41180 3/20 0.40
SLC6A2 P23975 2/20 0.40
HTR2C P28335 2/20 0.40
OPRM1 P35372 2/20 0.40
DRD3 P35462 2/20 0.40
KMT2A Q03164 1/20 0.40
MLNR O43193 1/20 0.40
ABCB11 O95342 1/20 0.40
ADRB1 P08588 1/20 0.40
ADORA3 P0DMS8 1/20 0.40
CYP2D6 P10635 1/20 0.40
CHRM1 P11229 1/20 0.40
DRD2 P14416 1/20 0.40
CHRM3 P20309 1/20 0.40
GLRA1 P23415 1/20 0.40
AVPR2 P30518 1/20 0.40
HRH1 P35367 1/20 0.40
MC3R P41968 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22738606 0.71 ALDH1A1 (0.46) ADRA2CSLC6A4CASRKMT2AADRA1B
SCHEMBL30826559 0.70 ALDH1A1 (0.52) ADRA2CSLC6A4ADRA1BCYP2C9ALDH1A1
SCHEMBL21217295 0.70 ALDH1A1 (0.52) ADRA2CSLC6A4ADRA1BCYP2C9ALDH1A1
SCHEMBL28653710 0.69 ADRA2A (0.47) ADRA2CSLC6A4KMT2AADRA1BCYP2C9
Naphthalene SCHEMBL28055820 0.69 CYP2A6 (0.44) KMT2AHTTALDH1A1CYP1A2
SCHEMBL3799100 0.69 ALDH1A1 (0.50) ADRA2CSLC6A4ADRA1BCYP2C9ALDH1A1
SCHEMBL5609974 0.69 ALDH1A1 (0.50) ADRA2CSLC6A4CASRSLC6A2HTR2C
SCHEMBL10409137 0.68 CYP2C9 (0.46) ADRA2CSLC6A4CASRSLC6A2HTR2C
SCHEMBL22326119 0.68 ALDH1A1 (0.54) ADRA2CSLC6A4ADRA1BCYP2C9ALDH1A1
SCHEMBL3247528 0.68 ALDH1A1 (0.54) ADRA2CSLC6A4CASRSLC6A2HTR2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105418927-A Low dielectric constant material film and preparation method thereof SHANGHAI ADVANCED RES INST CAS 2016-03-23 CN disclosed