Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | CTSS | P25774 | 1/20 | 0.34 |
| ▸ | CTSK | P43235 | 1/20 | 0.34 |
| ▸ | MAOA | P21397 | 2/20 | 0.34 |
| ▸ | MAOB | P27338 | 2/20 | 0.34 |
| ▸ | EBP | Q15125 | 2/20 | 0.34 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL107467 | 0.82 | TDP1 (0.43) | SMN1; SMN2RAB9AALDH1A1 | |
| SCHEMBL27646102 | 0.81 | RAB9A (0.37) | SMN1; SMN2RAB9AMEN1KMT2A | |
| SCHEMBL27791372 | 0.81 | ALDH1A1 (0.41) | SMN1; SMN2RAB9ASIGMAR1MEN1KMT2A | |
| SCHEMBL28065352 | 0.81 | RAB9A (0.38) | SMN1; SMN2RAB9ASIGMAR1MEN1KMT2A | |
| SCHEMBL28531764 | 0.80 | MAOA (0.47) | SMN1; SMN2RAB9AMAOASIGMAR1 | |
| SCHEMBL16766599 | 0.78 | ALDH1A1 (0.36) | NAAASMN1; SMN2MAOAMAOBMEN1 | |
| SCHEMBL1972960 | 0.78 | LMNA (0.39) | SMN1; SMN2RAB9AMEN1KMT2AALDH1A1 | |
| SCHEMBL13837050 | 0.78 | ANPEP (0.33) | SMN1; SMN2CTSSCTSKMAOAMAOB | |
| SCHEMBL28797034 | 0.76 | SMN1; SMN2 (0.35) | SMN1; SMN2RAB9ASIGMAR1MEN1KMT2A | |
| SCHEMBL27769950 | 0.76 | SMN1; SMN2 (0.35) | SMN1; SMN2RAB9ASIGMAR1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114055975-B | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-114055975-A | Ink jet recording method and ink jet recording apparatus | 精工爱普生株式会社 | 2022-02-18 | — | — | CN | disclosed |
| US-10392522-B2 | Ultraviolet curable composition and recorded object | SEIKO EPSON CORPORATION (JP) | 2019-08-27 | — | — | US | disclosed |
| US-10300708-B2 | Ink jet composition, housing, and ink jet method | SEIKO EPSON CORPORATION (JP) | 2019-05-28 | — | — | US | disclosed |
| US-10279603-B2 | Production method of recording material, and recording material | SEIKO EPSON CORPORATION (JP) | 2019-05-07 | — | — | US | disclosed |
| US-10259208-B2 | Three-dimensional shaped object manufacturing device, method for manufacturing three-dimensional shaped object, and three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2019-04-16 | — | — | US | disclosed |
| US-10053590-B2 | Composition for inkjet and recording material | SEIKO EPSON CORPORATION (JP) | 2018-08-21 | — | — | US | disclosed |
| US-9950507-B2 | Three-dimensional structure manufacturing apparatus, manufacturing method of three-dimensional structure, and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2018-04-24 | — | — | US | disclosed |
| US-9920210-B2 | Material including layer produced by ultraviolet-curable composition | SEIKO EPSON CORPORATION (JP) | 2018-03-20 | — | — | US | disclosed |
| US-9630339-B2 | Manufacturing method of three-dimensional structure and three-dimensional structure | SEIKO EPSON CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20100239776-A1 | METHOD FOR PRODUCING PLASTIC LENS | HOYA CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7776397-B2 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| EP-2168757-A1 | METHOD FOR PRODUCING PLASTIC LENS | Hoya Corporation (JP) | 2010-03-31 | — | — | EP | disclosed |
| US-20090077798-A1 | METHOD FOR FORMING CONDUCTIVE POST, METHOD FOR MANUFACTURING MULTILAYERED WIRING SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090071706-A1 | METHOD FOR PRODUCING MULTILAYERED WIRING SUBSTRATE, MULTILAYERED WIRING SUBSTRATE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-7500895-B2 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20080317943-A1 | METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | SEIKO EPSON CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080311285-A1 | CONTACT HOLE FORMING METHOD, CONDUCTING POST FORMING METHOD, WIRING PATTERN FORMING METHOD, MULTILAYERED WIRING SUBSTRATE PRODUCING METHOD, ELECTRO-OPTICAL DEVICE PRODUCING METHOD, AND ELECTRONIC APPARATUS PRODUCING METHOD | SEIKO EPSON CORPORATION (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20060019034-A1 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2006-01-26 | — | — | US | disclosed |