SCHEMBL28072000

SCHEMBL28072000

CC(C)(C)C(=O)OCNc1nc(N)nc(N)n1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.35
RAB9A P51151 3/20 0.35
TP53 P04637 1/20 0.35
GLA P06280 1/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA9 Q16790 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
GBA1 P04062 1/20 0.33
MAPT P10636 1/20 0.33
RECQL P46063 1/20 0.33
CYP1A2 P05177 1/20 0.32
GAA P10253 4/20 0.31
NPSR1 Q6W5P4 2/20 0.31
L3MBTL1 Q9Y468 3/20 0.31
PRKCA P17252 1/20 0.31
MCL1 Q07820 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28022609 0.81 L3MBTL1 (0.41) NPC1RAB9ATP53GLAMAPK1
SCHEMBL725070 0.73 CA1 (0.34) NPC1RAB9ATP53GLAMAPK1
SCHEMBL5075318 0.70 CA1 (0.33) CA1CA2CA9
SCHEMBL545236 0.70 CA1 (0.37) NPC1RAB9ATP53GLAMAPK1
SCHEMBL3105245 0.69 CA1 (0.39) NPC1RAB9ATP53GLAMAPK1
Formaldehyde SCHEMBL5702331 0.69 CA1 (0.38) NPC1RAB9ATP53GLAMAPK1
SCHEMBL3981799 0.68 CA1 (0.37) NPC1RAB9ATP53GLAMAPK1
SCHEMBL5281478 0.68 CA1 (0.31) CA1CA2CA9
SCHEMBL8578645 0.67 CA1 (0.35) NPC1RAB9ATP53GLAMAPK1
SCHEMBL963512 0.67 TLR8 (0.36) NPC1RAB9ATP53GLAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106661342-B Composition, cured film, pattern forming method, chromatic filter and its manufacturing method, solid state photo element and image display device 富士胶片株式会社 2019-07-16 CN disclosed
CN-109790679-A The manufacturing method of hydrophobing agent composition and hydrophobic fibre product 日华化学株式会社 2019-05-21 CN disclosed
CN-109643064-A Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, pattern formation method, method for producing electronic device, compound, and resin 富士胶片株式会社 2019-04-16 CN disclosed
CN-105940057-B Coloring composition, cured film, color filter and manufacturing method thereof, pattern forming method, and solid imaging element 富士胶片株式会社 2019-01-11 CN disclosed
CN-109071960-A Silicon-containing heterocyclic compound and matting agent 富士胶片和光纯药株式会社 2018-12-21 CN disclosed
CN-104185815-B Colour radiation sensitive compositions and its application 富士胶片株式会社 2018-03-23 CN disclosed
CN-107688278-A Negative resist composition and corrosion-resisting pattern forming method 信越化学工业株式会社 2018-02-13 CN disclosed
CN-107532069-A The manufacture method of water-repellent oil-repellent agent composition and water and oil repellant fibre 日华化学株式会社 2018-01-02 CN disclosed
CN-105899549-B Coloured composition, pattern formation method, the manufacture method of colored filter, colored filter, solid-state imaging element, the manufacture method of image display device and coloured composition 富士胶片株式会社 2018-01-02 CN disclosed
CN-107001807-A Matting agent 和光纯薬工业株式会社 2017-08-01 CN disclosed
CN-106661342-A Composition, cured film, pattern forming method, color filter, method for producing color filter, solid-state imaging element, and image display device 富士胶片株式会社 2017-05-10 CN disclosed
CN-105377997-B Method for producing dye multimer, and method for producing coloring composition 富士胶片株式会社 2017-04-12 CN disclosed
CN-105940057-A Coloring composition, cured film using same, color filter, pattern forming method, method for manufacturing color filter, solid-state imaging element, and image display device 富士胶片株式会社 2016-09-14 CN disclosed
CN-103476873-B Coloured composition and cured film, optical filter and preparation method, display device, photographic element and two pyrroles's methylene base system metal complexs 富士胶片株式会社 2016-08-10 CN disclosed