Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 2/20 | 0.37 |
| ▸ | CA9 | Q16790 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | TLR8 | Q9NR97 | 10/20 | 0.35 |
| ▸ | TLR7 | Q9NYK1 | 4/20 | 0.35 |
| ▸ | CDK1 | P06493 | 1/20 | 0.35 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.35 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.35 |
| ▸ | CDK2 | P24941 | 1/20 | 0.35 |
| ▸ | CCNA1 | P78396 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | DHFR | P00374 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL408240 | 0.89 | TLR8 (0.40) | CA1CA2CA9LMNAHTT | |
| SCHEMBL11053521 | 0.86 | NOS1 (0.42) | LMNAHTTTLR8TLR7CDK1 | |
| SCHEMBL1450095 | 0.86 | NOS1 (0.42) | LMNAHTTTLR8TLR7CDK1 | |
| SCHEMBL13241905 | 0.86 | CYP1A2 (0.38) | CA1CA2CA9LMNAHTT | |
| SCHEMBL963512 | 0.84 | TLR8 (0.36) | CA1CA2CA9LMNAHTT | |
| SCHEMBL3105245 | 0.83 | CA1 (0.39) | CA1CA2CA9NPC1TP53 | |
| SCHEMBL10940908 | 0.83 | CA1 (0.36) | CA1CA2CA9HSD17B10TLR8 | |
| Hexane SCHEMBL11397490 | 0.81 | TLR8 (0.42) | LMNAHTTTLR8TLR7NPC1 | |
| SCHEMBL9613719 | 0.81 | TLR8 (0.37) | LMNAHTTTLR8TLR7CDK1 | |
| SCHEMBL723591 | 0.81 | NPSR1 (0.59) | HSD17B10TP53RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250104915-A1 | RELEASE FILM AND METHOD FOR MANUFACTURING MULTILAYER ELECTRONIC COMPONENT USING THE SAME | SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) | 2025-03-27 | — | — | US | disclosed |
| CN-119659129-A | Release film and method for manufacturing multilayer electronic component using the same | 三星电机株式会社 | 2025-03-21 | — | — | CN | disclosed |
| CN-110007563-B | Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-107544208-B | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2022-05-31 | — | — | CN | disclosed |
| CN-113892057-A | Photosensitive resin composition and organic EL element partition wall | 昭和电工株式会社 | 2022-01-04 | — | — | CN | disclosed |
| CN-108137478-B | Compound, composition thereof, purification method, resist pattern formation method, and amorphous film production method | 三菱瓦斯化学株式会社 | 2021-09-28 | — | — | CN | disclosed |
| CN-107924123-B | Material for lithography, method for producing same, composition for lithography, method for forming pattern, compound, resin, and method for purifying same | 学校法人关西大学 | 2021-08-06 | — | — | CN | disclosed |
| CN-107428717-B | Resist composition, resist pattern forming method, and polyphenol compound used for same | 三菱瓦斯化学株式会社 | 2021-04-23 | — | — | CN | disclosed |
| CN-107533290-B | Resist base material, resist composition, and method for forming resist pattern | 三菱瓦斯化学株式会社 | 2021-04-09 | — | — | CN | disclosed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |
| CN-1645220-A | Radiation sensitive resin composition for forming partition, its forming method and liquid crystal display device | JSR CO LTD (JP) | 2005-07-27 | — | — | CN | disclosed |
| US-20040238486-A1 | Etching method and composition for forming etching protective layer | MERCK PATENT GMBH (DE) | 2004-12-02 | — | — | US | disclosed |
| EP-1429185-A1 | ETCHING METHOD AND COMPOSITION FOR FORMING ETCHING PROTECTIVE LAYER | Clariant International Ltd. (CH) | 2004-06-16 | — | — | EP | disclosed |
| EP-0903626-B1 | Amino-triazine compounds for (photo)thermographic materials | AGFA GEVAERT (BE) | 2004-02-04 | — | — | EP | disclosed |
| US-6063559-A | HIGH MAXIMUM DENSITY AND LOW MINIMUM DENSITY LEVELS AND IMPROVED ARCHIVABILITY AND/OR IMPROVED LIGHT STABILITY | AGFA-GEVAERT (BE) | 2000-05-16 | — | — | US | disclosed |
| EP-0903626-A1 | Amino-triazine compounds for (photo)thermographic materials | AGFA-GEVAERT N.V. (BE) | 1999-03-24 | — | — | EP | disclosed |
| EP-0154789-A1 | Polyfunctional phenolic reaction product, a process for its preparation and its use | THE DOW CHEMICAL COMPANY (US) | 1985-09-18 | — | — | EP | disclosed |
| EP-0016086-A4 | NON MELT-DRIP FLAME RETARDANT POLYCARBONATE ARTICLES. | GEN ELECTRIC (US) | 1980-10-16 | — | — | EP | disclosed |
| EP-0016086-A1 | NON MELT-DRIP FLAME RETARDANT POLYCARBONATE ARTICLES. | GEN ELECTRIC (US) | 1980-10-01 | — | — | EP | disclosed |
| WO-1980000143-A1 | NON MELT-DRIP FLAME RETARDANT POLYCARBONATE COMPOSITION | GEN ELECTRIC (US) | 1980-02-07 | — | — | WO | disclosed |