1,2-Diethoxybenzene

1,2-Diethoxybenzene

SCHEMBL28074336

CCC=O.CCOc1ccccc1OCC

nearest known ligand 0.57

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 5/20 0.57
MAPT P10636 1/20 0.57
NPSR1 Q6W5P4 1/20 0.57
GLA P06280 1/20 0.57
ALDH1A1 P00352 6/20 0.54
HCRTR1 O43613 1/20 0.50
CYP2C19 P33261 2/20 0.48
CYP1A2 P05177 1/20 0.48
CYP2D6 P10635 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
HTR1A P08908 1/20 0.47
ADRA1D P25100 1/20 0.47
ADRA1A P35348 1/20 0.47
ADRA1B P35368 1/20 0.47
GAA P10253 1/20 0.46
LMNA P02545 1/20 0.45
ALOX15 P16050 1/20 0.44
MRGPRX4 Q96LA9 1/20 0.44
HPGD P15428 1/20 0.43
HTT P42858 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3946342 0.87 L3MBTL1 (0.53) L3MBTL1MAPTNPSR1GLAALDH1A1
1,2-Diethoxybenzene SCHEMBL578986 0.85 ALDH1A1 (0.68) L3MBTL1MAPTNPSR1GLAALDH1A1
1,2-Diethoxybenzene SCHEMBL29428929 0.85 ALDH1A1 (0.68) L3MBTL1MAPTNPSR1GLAALDH1A1
SCHEMBL5311090 0.84 L3MBTL1 (0.59) L3MBTL1MAPTNPSR1GLAALDH1A1
Propionaldehyde SCHEMBL27622800 0.83 L3MBTL1 (0.46) L3MBTL1MAPTNPSR1GLAALDH1A1
SCHEMBL2096024 0.83 L3MBTL1 (0.53) L3MBTL1MAPTNPSR1GLAALDH1A1
Phenetole SCHEMBL27329111 0.80 LTA4H (0.63) L3MBTL1MAPTALDH1A1TDP1GAA
SCHEMBL2556550 0.79 L3MBTL1 (0.59) L3MBTL1MAPTNPSR1GLAALDH1A1
1,2-Dimethoxybenzene SCHEMBL27275894 0.79 CA1 (0.62) L3MBTL1MAPTALDH1A1TDP1LMNA
SCHEMBL535646 0.78 ALDH1A1 (0.73) L3MBTL1MAPTNPSR1GLAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108196426-A For the photoresist of GPP techniques, preparation method and its photoetching process 潍坊星泰克微电子材料有限公司 2018-06-22 CN claimed
CN-110461589-A Polymeric substrate with hard conating TEIJIN LTD 2019-11-15 CN disclosed
CN-110402275-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern in display substrate using the same, and bezel pattern manufactured thereby LG CHEMICAL LTD 2019-11-01 CN disclosed
CN-110291121-A Gap filler, the tool for processing gap filler and external member and illuminating device KDS控股有限公司 2019-09-27 CN disclosed
CN-107004384-B Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2019-09-06 CN disclosed
CN-106164132-B polyimide composition 富士胶片电子材料美国有限公司 2019-08-23 CN disclosed
CN-106488959-B Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate by using same, and frame pattern manufactured by using same 株式会社LG化学 2019-08-23 CN disclosed
CN-110088163-A Curable resin composition, and film, molded article, prepreg, and fiber-reinforced plastic using same 三菱化学株式会社 2019-08-02 CN disclosed
CN-105849862-B Resin combination, dry-etching photoresistive mask and pattern forming method DIC株式会社 2019-07-05 CN disclosed
CN-109750523-A Synthetic leather and its manufacturing method DIC株式会社 2019-05-14 CN disclosed
CN-107004384-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001826-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern of display substrate using the same, and bezel pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001824-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001825-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-105658699-B Fluorine-containing compound, composition for forming hard coat layer, and article having hard coat layer 旭硝子株式会社 2017-06-23 CN disclosed
CN-106536644-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern of display substrate using the same, and bezel pattern manufactured thereby 株式会社LG化学 2017-03-22 CN disclosed
CN-106488959-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate by using same, and frame pattern manufactured by using same 株式会社LG化学 2017-03-08 CN disclosed
CN-106164132-A Novel polyimide compositions 富士胶片电子材料美国有限公司 2016-11-23 CN disclosed
CN-106032444-A Anti-reflection glue film and manufacturing method thereof 逢甲大学 2016-10-19 CN disclosed
CN-104080877-B Anti-fingerprint adhesive agent and manufacture method, hard coat compositions, the base material with hard coat and touch screen 旭硝子株式会社 2016-08-17 CN disclosed