SCHEMBL28093002

SCHEMBL28093002

CCCOC(=O)C(C)=COc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.47
GAA P10253 2/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
ALDH1A1 P00352 5/20 0.45
POLB P06746 2/20 0.43
KMT2A Q03164 4/20 0.41
MAPT P10636 3/20 0.41
MEN1 O00255 3/20 0.41
HPGD P15428 2/20 0.41
THRB P10828 1/20 0.41
RECQL P46063 1/20 0.39
MTNR1A P48039 1/20 0.37
MTNR1B P49286 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27557322 0.91 TSHR (0.47) LMNASMN1; SMN2ALDH1A1POLBKMT2A
SCHEMBL27768460 0.88 TSHR (0.50) LMNASMN1; SMN2ALDH1A1POLB
SCHEMBL547242 0.88 ALDH1A1 (0.42) LMNAGAASMN1; SMN2ALDH1A1KMT2A
SCHEMBL12851497 0.87 MEN1 (0.51) LMNAGAAALDH1A1POLBKMT2A
SCHEMBL93317 0.87 MEN1 (0.51) LMNAGAAALDH1A1POLBKMT2A
SCHEMBL26673753 0.87 THRB (0.45) LMNASMN1; SMN2ALDH1A1KMT2AMAPT
SCHEMBL1308171 0.86 LMNA (0.49) LMNAGAASMN1; SMN2ALDH1A1POLB
SCHEMBL2778055 0.86 LMNA (0.49) LMNAGAASMN1; SMN2ALDH1A1POLB
SCHEMBL28601171 0.82 ALDH1A1 (0.38) LMNAGAASMN1; SMN2ALDH1A1KMT2A
SCHEMBL4122674 0.82 ALDH1A1 (0.38) LMNAGAASMN1; SMN2ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104364320-B Organic and inorganic blend compositions, its manufacture method, optical sheet and Optical devices 长康化工有限公司 2016-09-07 CN disclosed
CN-1908816-B Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORP 2012-09-05 CN disclosed
CN-1908816-A Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORP (JP) 2007-02-07 CN disclosed