SCHEMBL28096899

SCHEMBL28096899

Cc1cc(Cc2cccc(O)c2)cc(C)c1O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDH1 O75874 2/20 0.49
SHBG P04278 1/20 0.48
ESR1 P03372 1/20 0.48
ESR2 Q92731 1/20 0.48
ENPP2 Q13822 1/20 0.48
HMGB1 P09429 1/20 0.46
CXCL12 P48061 1/20 0.46
CHRM2 P08172 1/20 0.46
CHRM1 P11229 1/20 0.46
CHRM3 P20309 1/20 0.46
DRD2 P14416 2/20 0.46
DRD1 P21728 2/20 0.46
TAAR1 Q96RJ0 1/20 0.46
CYP1A2 P05177 1/20 0.44
CYP3A4 P08684 1/20 0.44
PKM P14618 1/20 0.44
ALOX15 P16050 1/20 0.44
NFKB1 P19838 1/20 0.44
MAPK1 P28482 1/20 0.44
ACHE P22303 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2166973 0.90 ESR1 (0.54) IDH1SHBGESR1ESR2HMGB1
SCHEMBL29290541 0.90 SHBG (0.56) IDH1SHBGESR1ESR2ENPP2
SCHEMBL30375187 0.90 SHBG (0.56) IDH1SHBGESR1ESR2ENPP2
Phenol SCHEMBL3002830 0.84 HMGB1 (0.53) SHBGESR1ESR2HMGB1CXCL12
Phenol SCHEMBL15239719 0.84 HMGB1 (0.53) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL30979264 0.83 ENPP2 (0.65) IDH1ENPP2CHRM2CHRM1CHRM3
SCHEMBL70267 0.83 ENPP2 (0.65) IDH1ENPP2CHRM2CHRM1CHRM3
SCHEMBL9480008 0.82 HMGB1 (0.55) IDH1SHBGESR1ESR2HMGB1
SCHEMBL12323442 0.81 SHBG (0.46) SHBGESR1ESR2HMGB1CXCL12
SCHEMBL10427465 0.81 SHBG (0.57) SHBGESR1ESR2HMGB1CXCL12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106444289-A UV irradiation apparatus, resist pattern forming apparatus, UV irradiation method, and resist pattern forming method 东京应化工业株式会社 2017-02-22 CN disclosed
CN-103592819-B Photosensitive resin composition, spacer, protective film and liquid crystal display element formed from the same 奇美实业股份有限公司 2016-08-24 CN disclosed