Ethane

Ethane

SCHEMBL28105966

CC.NCc1cc(O)c(C2CCCCC2)cc1-c1ccccc1O

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NUDT1 P36639 1/20 0.44
▸ BACE1 P56817 1/20 0.44
▸ IKBKB O14920 4/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ LMNA P02545 1/20 0.36
▸ TDP1 Q9NUW8 1/20 0.36
▸ HSP90AA1 P07900 1/20 0.35
▸ PDE4D Q08499 1/20 0.34
▸ PDE7A Q13946 1/20 0.34
▸ PTGS2 P35354 1/20 0.34
▸ DPP4 P27487 1/20 0.34
▸ KDM4E B2RXH2 1/20 0.34
▸ MAPT P10636 1/20 0.34
▸ L3MBTL1 Q9Y468 1/20 0.34
▸ CAMKK2 Q96RR4 1/20 0.34
▸ NR1I2 O75469 3/20 0.33
▸ SMARCA2 P51531 3/20 0.33
▸ SMARCA4 P51532 3/20 0.33
▸ NR1H3 Q13133 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL28253356 0.90 NUDT1 (0.44) NUDT1BACE1MEN1KMT2AHSP90AA1
Ethane SCHEMBL28119304 0.82 NUDT1 (0.44) NUDT1BACE1HSP90AA1PDE4DPDE7A
Ethane SCHEMBL28252614 0.81 NUDT1 (0.44) NUDT1BACE1MEN1KMT2AHSP90AA1
Ethane SCHEMBL27615405 0.81 NUDT1 (0.46) NUDT1BACE1HSP90AA1PTGS2CAMKK2
SCHEMBL27870516 0.77 NUDT1 (0.45) NUDT1BACE1HSP90AA1HDAC4HDAC2
Ethane SCHEMBL28833111 0.76 TDP1 (0.42) NUDT1BACE1MEN1KMT2ALMNA
SCHEMBL28278535 0.75 NUDT1 (0.43) NUDT1BACE1MEN1KMT2AHSP90AA1
SCHEMBL18948598 0.74 NUDT1 (0.42) NUDT1BACE1MEN1KMT2ALMNA
Ethane SCHEMBL28106473 0.74 BACE1 (0.44) NUDT1BACE1HSP90AA1PTGS2
Ethane SCHEMBL28854299 0.73 CAMKK2 (0.46) NUDT1BACE1IKBKBMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106200267-A Positive photosensitive resin composition, pattern forming method and application thereof 奇美实业股份有限公司 2016-12-07 — — CN disclosed
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