Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NUDT1 | P36639 | 1/20 | 0.46 |
| ▸ | BACE1 | P56817 | 1/20 | 0.46 |
| ▸ | HSP90AA1 | P07900 | 3/20 | 0.37 |
| ▸ | APP | P05067 | 2/20 | 0.35 |
| ▸ | QDPR | P09417 | 1/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 2/20 | 0.32 |
| ▸ | ERCC1 | P07992 | 1/20 | 0.32 |
| ▸ | ERCC4 | Q92889 | 1/20 | 0.32 |
| ▸ | CAMKK1 | Q8N5S9 | 1/20 | 0.31 |
| ▸ | CAMKK2 | Q96RR4 | 1/20 | 0.31 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.31 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethane SCHEMBL28106473 | 0.91 | BACE1 (0.44) | NUDT1BACE1HSP90AA1APPQDPR | |
| Ethane SCHEMBL28119304 | 0.88 | NUDT1 (0.44) | NUDT1BACE1HSP90AA1PTGS2HTR2A | |
| Ethane SCHEMBL27512684 | 0.81 | NUDT1 (0.40) | NUDT1BACE1HSP90AA1APPQDPR | |
| Ethane SCHEMBL28105966 | 0.81 | NUDT1 (0.44) | NUDT1BACE1HSP90AA1PTGS2CAMKK2 | |
| Ethane SCHEMBL28253356 | 0.81 | NUDT1 (0.44) | NUDT1BACE1HSP90AA1PTGS2HTR2A | |
| Ethane SCHEMBL28252614 | 0.80 | NUDT1 (0.44) | NUDT1BACE1HSP90AA1THRBHTR2A | |
| SCHEMBL28207069 | 0.80 | NUDT1 (0.41) | NUDT1BACE1HSP90AA1HTR2A | |
| Ethane SCHEMBL27596791 | 0.77 | APP (0.40) | NUDT1BACE1HSP90AA1APPPTGS2 | |
| SCHEMBL27522139 | 0.75 | NUDT1 (0.53) | NUDT1BACE1HSP90AA1THRBERCC1 | |
| SCHEMBL27474169 | 0.72 | NUDT1 (0.48) | NUDT1BACE1HSP90AA1THRBHTR2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107870516-A | Positive photosensitive resin composition, patterned film and method for manufacturing bump | 奇美实业股份有限公司 | 2018-04-03 | — | — | CN | disclosed |
| CN-107544209-A | Positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2018-01-05 | — | — | CN | disclosed |
| CN-103969952-B | New compound and its manufacture method, acid agent, anti-corrosion agent composition and Resist patterns forming method | 东京应化工业株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-103885294-B | Photosensitive polysiloxane composition, protective film and element with protective film | 奇美实业股份有限公司 | 2017-07-14 | — | — | CN | disclosed |
| CN-106918994-A | Photosensitive resin composition for black matrix and application thereof | 奇美实业股份有限公司 | 2017-07-04 | — | — | CN | disclosed |
| CN-106909028-A | Photosensitive resin composition, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2017-06-30 | — | — | CN | disclosed |
| CN-106338888-A | Photosensitive resin composition, protective film and element | 奇美实业股份有限公司 | 2017-01-18 | — | — | CN | disclosed |
| CN-103698977-B | Photosensitive resin composition, protective film and element with protective film | 奇美实业股份有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-103885289-B | Photosensitive resin composition, color filter and liquid crystal display element thereof | 奇美实业股份有限公司 | 2017-01-04 | — | — | CN | disclosed |
| CN-106200267-A | Positive photosensitive resin composition, pattern forming method and application thereof | 奇美实业股份有限公司 | 2016-12-07 | — | — | CN | disclosed |
| CN-102445852-A | Positive photosensitive resin composition and method for forming pattern | CHI MEI CORP | 2012-05-09 | — | — | CN | disclosed |
| CN-102443265-A | Photo-curing polysiloxane composition and substrate protective film formed by same | CHI MEI CORP | 2012-05-09 | — | — | CN | disclosed |
| CN-101907827-B | Positive photosensitive resin composition and liquid crystal orientation control protrusion formed therefrom | CHI MEI IND CO LTD | 2011-11-23 | — | — | CN | disclosed |
| CN-101907827-A | Positive photosensitive resin composition and liquid crystal orientation control protrusion formed therefrom | CHI MEI IND CO LTD | 2010-12-08 | — | — | CN | disclosed |
| CN-1853140-B | Positive photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO LTD | 2010-08-25 | — | — | CN | disclosed |
| CN-101470349-A | Resist composition, method for forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD (JP) | 2009-07-01 | — | — | CN | disclosed |
| CN-101464628-A | Novel compound and method for producing same, acid generator, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2009-06-24 | — | — | CN | disclosed |
| CN-101408728-A | Resist composition, method of forming resist pattern, novel compound and method of producing the same | TOKYO OHKA KOGYO CO LTD (JP) | 2009-04-15 | — | — | CN | disclosed |
| CN-1853140-A | Positive photoresist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2006-10-25 | — | — | CN | disclosed |
| CN-1584742-A | Positive light sensitive resin composition | QIMEI IND CO LTD (CN) | 2005-02-23 | — | — | CN | disclosed |