SCHEMBL28108652

SCHEMBL28108652

Cc1ccc(C[Au])c(OC#N)c1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.35
SLC6A4 P31645 2/20 0.33
KDM4E B2RXH2 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
HTR2A P28223 1/20 0.33
KCNH2 Q12809 1/20 0.33
TSHR P16473 1/20 0.33
SLC6A2 P23975 1/20 0.32
L3MBTL4 Q8NA19 1/20 0.31
L3MBTL3 Q96JM7 1/20 0.31
LMNA P02545 1/20 0.31
HTT P42858 1/20 0.31
CYP2C9 P11712 1/20 0.31
MPO P05164 1/20 0.30
AMY1A P0DUB6 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9418520 0.80 CYP3A4 (0.40) KDM4EL3MBTL1TSHRLMNACYP2C9
SCHEMBL4449148 0.78 AMY1A (0.39) ACHESLC6A4HTR2AKCNH2SLC6A2
SCHEMBL11108932 0.75 TSHR (0.44) ACHETSHRLMNAHTTCYP2C9
(Chloromethyl)Benzene SCHEMBL11865549 0.75 CYP3A4 (0.36) KDM4EL3MBTL1TSHRLMNACYP2C9
SCHEMBL27516451 0.73 L3MBTL1 (0.40) ACHESLC6A4KDM4EL3MBTL1HTR2A
SCHEMBL21439789 0.72 ACHE (0.43) ACHEKDM4EL3MBTL1HTTCYP2C9
SCHEMBL8985167 0.71 GAA (0.44) ACHEL3MBTL1TSHRCA1CA2
SCHEMBL29489134 0.71 GAA (0.44) ACHEL3MBTL1TSHRCA1CA2
SCHEMBL16742413 0.70 L3MBTL1 (0.51) SLC6A4KDM4EL3MBTL1TSHRSLC6A2
SCHEMBL8961905 0.68 AMY1A (0.35) ACHEKDM4EL3MBTL1TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104755422-B Method for producing cyanogen halide, cyanate ester compound and method for producing same, and resin composition 三菱瓦斯化学株式会社 2016-11-09 CN disclosed