Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Trolamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trolamine SCHEMBL11472536 | 0.90 | MAPT (0.40) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL27336459 | 0.88 | MAPT (0.38) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL28111830 | 0.86 | MAPT (0.44) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL28156459 | 0.82 | MAPT (0.50) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL10951119 | 0.82 | MAPT (0.41) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL28007172 | 0.82 | MAPT (0.41) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL721955 | 0.82 | MAPT (0.50) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL6942949 | 0.82 | MAPT (0.41) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL7028937 | 0.82 | MAPT (0.43) | MAPTHPGDMAPK1CYP1A2CYP2C9 | |
| Trolamine SCHEMBL28296669 | 0.82 | MAPT (0.41) | MAPTHPGDMAPK1CYP1A2CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110383172-A | Resist pattern forming method | 日本瑞翁株式会社 | 2019-10-25 | — | — | CN | disclosed |
| CN-110352384-A | Photosensitive resin composition | 昭和电工株式会社 | 2019-10-18 | — | — | CN | disclosed |
| CN-110088679-A | Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, pattern formation method, method for producing electronic device, and photoacid generator | 富士胶片株式会社 | 2019-08-02 | — | — | CN | disclosed |
| CN-105637130-B | Photonasty fiber and its manufacturing method | 日产化学工业株式会社 | 2019-07-19 | — | — | CN | disclosed |
| CN-105891912-B | Mold | 住友化学株式会社 | 2019-07-05 | — | — | CN | disclosed |
| CN-109803990-A | Method for producing resin and method for producing actinic ray-sensitive or radiation-sensitive composition | 富士胶片株式会社 | 2019-05-24 | — | — | CN | disclosed |
| CN-109715855-A | The manufacturing method of perforated metal foil | 富士胶片株式会社 | 2019-05-03 | — | — | CN | disclosed |
| CN-109643064-A | Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, pattern formation method, method for producing electronic device, compound, and resin | 富士胶片株式会社 | 2019-04-16 | — | — | CN | disclosed |
| CN-109069944-A | Purification device, purification method, production device, method for producing chemical liquid, container, and chemical liquid container | 富士胶片株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-109071104-A | The manufacturing method of semiconductors manufacture treatment fluid, the accepting container for containing semiconductors manufacture treatment fluid, pattern forming method and electronic device | 富士胶片株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-108885410-A | The manufacturing method of electronic material manufacture medical fluid, pattern forming method, the manufacturing method of semiconductor device, electronic material are manufactured with medical fluid, container and quality inspection method | 富士胶片株式会社 | 2018-11-23 | — | — | CN | disclosed |
| CN-108700835-A | Resist pattern forming method and resist | 日本瑞翁株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108700812-A | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST | 日本瑞翁株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-108027555-A | Positive type photosensitive organic compound | 昭和电工株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-106796401-A | Pattern forming method, composition for forming upper layer film, resist pattern, and method for manufacturing electronic device | 富士胶片株式会社 | 2017-05-31 | — | — | CN | disclosed |
| CN-106716257-A | Pattern forming method, resist pattern, and electronic device manufacturing method | 富士胶片株式会社 | 2017-05-24 | — | — | CN | disclosed |
| CN-106605174-A | Pattern forming method, composition for forming protective film, method for manufacturing electronic component, and electronic component | 富士胶片株式会社 | 2017-04-26 | — | — | CN | disclosed |
| CN-106552517-A | Barrier filter and filter method, photoetching medicinal liquid purify the manufacture method and Resist patterns forming method of product | 东京应化工业株式会社 | 2017-04-05 | — | — | CN | disclosed |