Water

Water

SCHEMBL2817951

CC(C)[N+](C)(O)O.[OH-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5142546 0.95
SCHEMBL10382653 0.91
Fluoride Ion SCHEMBL4617075 0.91
Hydrochloric Acid SCHEMBL5157338 0.91
Water SCHEMBL190437 0.82
SCHEMBL144709 0.76
Water SCHEMBL2817747 0.76
SCHEMBL8192716 0.75 MEN1 (0.35)
SCHEMBL9752218 0.73
SCHEMBL21107989 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119144236-A Polishing solution and preparation method thereof 江苏山水半导体科技有限公司 2024-12-17 CN claimed
US-20240230608-A9 SELECTIVE MONITORING OF BASE CHEMICALS ECI TECHNOLOGY, INC. (US) 2024-07-11 US claimed
US-20240133852-A1 SELECTIVE MONITORING OF BASE CHEMICALS ECI TECHNOLOGY, INC. (US) 2024-04-25 US claimed
WO-2022159273-A1 SELECTIVE MONITORING OF BASE CHEMICALS ECI TECHNOLOGY, INC. (US) 2022-07-28 WO claimed
EP-1266956-B1 Composition for washing a polishing pad and method for washing a polishing pad JSR CORP (JP) 2006-04-19 EP claimed
US-6740629-B2 COMPRISES A COMPONENT FOR RENDERING A WATER-INSOLUBLE COMPOUND CONTAINING A METAL ATOM OR ITS ION SEPARATED FROM A SURFACE TO BE POLISHED WATER-SOLUBLE JSR CORPORATION (JP) 2004-05-25 US claimed
US-20030004085-A1 Composition for washing a polishing pad and method for washing a polishing pad JSR CORPORATION (JP) 2003-01-02 US claimed
EP-1266956-A1 Composition for washing a polishing pad and method for washing a polishing pad JSR Corporation (JP) 2002-12-18 EP claimed
CN-119144236-A Polishing solution and preparation method thereof 江苏山水半导体科技有限公司 2024-12-17 CN disclosed
US-20240230608-A9 SELECTIVE MONITORING OF BASE CHEMICALS ECI TECHNOLOGY, INC. (US) 2024-07-11 US disclosed
US-20240133852-A1 SELECTIVE MONITORING OF BASE CHEMICALS ECI TECHNOLOGY, INC. (US) 2024-04-25 US disclosed
WO-2022159273-A1 SELECTIVE MONITORING OF BASE CHEMICALS ECI TECHNOLOGY, INC. (US) 2022-07-28 WO disclosed
CN-113416616-A Preparation method of semiconductor environment-friendly cleaning agent 东莞市柯林奥环保科技有限公司 2021-09-21 CN disclosed
US-9944853-B2 Color inhibitor for quaternary ammonium hydroxide in non-aqueous solvent SACHEM, INC. (US) 2018-04-17 US disclosed
EP-0684067-A1 Process for treating acidic exhaust gas TAMA CHEMICALS CO., LTD. (JP) 1995-11-29 EP disclosed
EP-0652041-A2 Method for producing high purity hydroxides and alkoxides Sachem, Inc. (US) 1995-05-10 EP disclosed
US-5389211-A Method for producing high purity hydroxides and alkoxides SACHEM, INC. (US) 1995-02-14 US disclosed
EP-0445119-A1 METHOD FOR PURIFYING QUATERNARY AMMONIUM HYDROXIDES SACHEM, INC. (US) 1991-09-11 EP disclosed
US-4938854-A Electrolysis SOUTHWESTERN ANALYTICAL CHEMICALS, INC. (US) 1990-07-03 US disclosed
WO-1990006382-A1 METHOD FOR PURIFYING QUATERNARY AMMONIUM HYDROXIDES SOUTHWESTERN ANALYTICAL CHEMICALS, INC. (US) 1990-06-14 WO disclosed