Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL144709 | 0.95 | — | — | |
| Hydrochloric Acid SCHEMBL2439108 | 0.91 | — | — | |
| Fluoride Ion SCHEMBL190899 | 0.91 | — | — | |
| SCHEMBL9752218 | 0.91 | — | — | |
| Water SCHEMBL2817951 | 0.82 | — | — | |
| Perchlorate SCHEMBL6561565 | 0.81 | — | — | |
| Water SCHEMBL2817747 | 0.76 | — | — | |
| SCHEMBL5142546 | 0.76 | — | — | |
| SCHEMBL10385914 | 0.75 | BBOX1 (0.30) | — | |
| Formic Acid SCHEMBL3812921 | 0.75 | BBOX1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 535 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119144236-A | Polishing solution and preparation method thereof | 江苏山水半导体科技有限公司 | 2024-12-17 | — | — | CN | claimed |
| US-20240230608-A9 | SELECTIVE MONITORING OF BASE CHEMICALS | ECI TECHNOLOGY, INC. (US) | 2024-07-11 | — | — | US | claimed |
| US-20240133852-A1 | SELECTIVE MONITORING OF BASE CHEMICALS | ECI TECHNOLOGY, INC. (US) | 2024-04-25 | — | — | US | claimed |
| CN-113265037-B | Polyisocyanate composition and preparation method and application thereof | 万华化学（宁波）有限公司 | 2023-03-24 | — | — | CN | claimed |
| CN-115286588-A | Process for preparing pentamethylene isocyanurate | 中海油常州涂料化工研究院有限公司 | 2022-11-04 | — | — | CN | claimed |
| WO-2022159273-A1 | SELECTIVE MONITORING OF BASE CHEMICALS | ECI TECHNOLOGY, INC. (US) | 2022-07-28 | — | — | WO | claimed |
| CN-114249868-A | Polyisocyanate composition with stable storage and preparation method thereof | 万华化学集团股份有限公司 | 2022-03-29 | — | — | CN | claimed |
| CN-113698572-A | Polyisocyanate composition, preparation method and application | 万华化学（宁波）有限公司 | 2021-11-26 | — | — | CN | claimed |
| CN-109135580-B | Polishing solution for glass and preparation method thereof | 蓝思科技（长沙）有限公司 | 2021-04-02 | — | — | CN | claimed |
| CN-110577823-A | Nano abrasive, polishing solution, preparation method and application | 蓝思科技（长沙）有限公司 | 2019-12-17 | — | — | CN | claimed |
| EP-0792890-B1 | Process for preparing phosphonate-terminated polymers | ROHM & HAAS (US) | 1999-12-29 | — | — | EP | claimed |
| WO-1999060083-A1 | CLEANING COMPOSITION AND METHOD FOR REMOVING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 1999-11-25 | — | — | WO | claimed |
| WO-1999051796-A1 | METHOD FOR REMOVING PHOTORESIST AND PLASMA ETCH RESIDUES | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-10-14 | — | — | WO | claimed |
| EP-0944708-A1 | NON-CORROSIVE CLEANING COMPOSITION FOR REMOVING PLASMA ETCHING RESIDUES | Olin Microelectronic Chemicals, Inc. (US) | 1999-09-29 | — | — | EP | claimed |
| US-5866664-A | UNSATURATED CARBOXYLIC ACID MONOMERS | ROHM AND HAAS COMPANY (US) | 1999-02-02 | — | — | US | claimed |
| US-5814432-A | FORMING RADIATION SENSITIVE LAYER ON SUBSTRATE, CONTAINS FIRST COMPONENT WHICH GENERATES ACID BY CHEMICAL RADIATION AND SECOND COMPONENT THAT HAS BOND BEING DECOMPOSED BY GENERATED ACID | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-09-29 | — | — | US | claimed |
| US-5780406-A | MIXTURE OF HYDROXYLAMMONIUM SALT AND AMINE AND/OR QUATERNARY AMMONIUM HYDROXIDE; SEMICONDUCTORS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 1998-07-14 | — | — | US | claimed |
| US-5756267-A | QUATERNARY AMMONIUM BASES WITH SURFACTANTS TO DEVELOP SHARP IMAGES | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-26 | — | — | US | claimed |
| WO-1998010050-A1 | NON-CORROSIVE CLEANING COMPOSITION FOR REMOVING PLASMA ETCHING RESIDUES | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1998-03-12 | — | — | WO | claimed |
| EP-0792890-A1 | Process for preparing phosphonate-terminated polymers | ROHM AND HAAS COMPANY (US) | 1997-09-03 | — | — | EP | claimed |