SCHEMBL2819121

SCHEMBL2819121

C=CC(O)(O)OCCCCC

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.39
CES1 P23141 1/20 0.37
ALDH1A1 P00352 1/20 0.37
HPGD P15428 1/20 0.36
LPAR1 Q92633 3/20 0.35
LPAR3 Q9UBY5 3/20 0.35
LPAR2 Q9HBW0 2/20 0.35
MEN1 O00255 1/20 0.34
THRB P10828 1/20 0.34
HTT P42858 1/20 0.34
KMT2A Q03164 1/20 0.34
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA9 Q16790 1/20 0.34
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9679070 0.79 CES1 (0.39) TSHRCES1HPGDLPAR1LPAR3
SCHEMBL10339539 0.76 TSHR (0.36) TSHRCES1ALDH1A1HPGDMEN1
SCHEMBL7935122 0.74 TSHR (0.34) TSHRALDH1A1HPGDMEN1THRB
SCHEMBL10494265 0.74 TSHR (0.39) TSHRLPAR1LPAR3LPAR2MEN1
SCHEMBL9348390 0.74 CES2 (0.37) TSHRCES1ALDH1A1HPGDMEN1
SCHEMBL27381650 0.74 MEN1 (0.39) TSHRCES1ALDH1A1LPAR1LPAR3
SCHEMBL27747219 0.74 MEN1 (0.39) TSHRCES1ALDH1A1LPAR1LPAR3
SCHEMBL8414742 0.73 CES1 (0.44) TSHRCES1LPAR1LPAR3LPAR2
SCHEMBL11323980 0.73 CES1 (0.39) TSHRCES1LPAR1LPAR3LPAR2
SCHEMBL27436364 0.73 CES1 (0.44) TSHRCES1LPAR1LPAR3LPAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103513522-B Semiconductor cleaning combination 青岛果子科技服务平台有限公司 2018-06-01 CN claimed
CN-107460062-A A kind of novel diode semiconductor special cleaning 如皋市下原科技创业服务有限公司 2017-12-12 CN claimed
CN-101842746-B Photoresist cleaning agent 安集微电子(上海)有限公司 2017-09-15 CN claimed
CN-102804074-B Resist stripping compositions and methods for manufacturing electrical devices BASF SE 2015-03-04 CN claimed
CN-103513524-A Semiconductor remover YANG GUIWANG 2014-01-15 CN claimed
CN-103513522-A Semiconductor cleaning composition YANG GUIWANG 2014-01-15 CN claimed
CN-101548241-B Low etching photoresist cleaning agent ANJI MICROELECTRONICS CO LTD 2012-05-30 CN claimed
CN-101755240-B Cleaning composition for removing resist ANJI MICROELECTRONICS CO LTD 2012-04-04 CN claimed
CN-101529339-B Low etched photoresist cleaning agent and cleaning method of using same ANJI MICROELECTRONICS (SHANGHAI) Co.,Ltd. (CN) 2011-11-30 CN claimed
CN-102209938-A Rinse solution for removing thick film resist ANJI MICROELECTRONICS SHANGHAI 2011-10-05 CN claimed
CN-101685272-A Photoresist cleaning agent ANJI MICROELECTRONICS CO LTD 2010-03-31 CN claimed
CN-101548241-A Low etching photoresist cleaning agent ANJI MICROELECTRONICS CO LTD (CN) 2009-09-30 CN claimed
CN-101529339-A Low etching photoresist cleaning agent and cleaning method thereof ANJI MICROELECTRONICS SHANGHAI (CN) 2009-09-09 CN claimed
CN-101523300-A Low-etching photoresist cleaning agent and cleaning method thereof ANJI MICROELECTRONICS SHANGHAI (CN) 2009-09-02 CN claimed
CN-101398638-A Detergent for photo resist ANJI MICROELECTRONICS CO LTD (CN) 2009-04-01 CN claimed
CN-101339368-A Photoresist cleaning agent ANJI MICROELECTRONICS CO LTD (CN) 2009-01-07 CN claimed
CN-101201556-A Photoresist detergent with low etching property ANJI MICROELECTRONICS CO LTD (CN) 2008-06-18 CN claimed
CN-101187787-A Low etching photoresist cleaning agent and its cleaning method ANJI MICROELECTRONICS CO LTD (CN) 2008-05-28 CN claimed
CN-101169597-A Photoresist detergent ANJI MICROELECTRONICS CO LTD (CN) 2008-04-30 CN claimed
CN-101162369-A Low etching photoresist cleaning agent and cleaning method thereof ANJI MICROELECTRONICS CO LTD (CN) 2008-04-16 CN claimed