Ethane

Ethane

SCHEMBL28200320

CC.Cc1cc(-c2ccccc2O)cc(C2CCCCC2)c1O

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 3/20 0.40
▸ MEN1 O00255 2/20 0.40
▸ LMNA P02545 2/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ CAMKK2 Q96RR4 1/20 0.39
▸ PTPN5 P54829 4/20 0.39
▸ PTPN2 P17706 1/20 0.39
▸ PTGS2 P35354 1/20 0.38
▸ KDM4E B2RXH2 5/20 0.38
▸ MAPT P10636 4/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ ALDH1A1 P00352 4/20 0.36
▸ HPGD P15428 4/20 0.36
▸ HSD17B10 Q99714 3/20 0.36
▸ BCL2L1 Q07817 1/20 0.36
▸ ALOX5 P09917 1/20 0.35
▸ CCNT1 O60563 1/20 0.35
▸ CDK9 P50750 1/20 0.35
▸ HDAC2 Q92769 2/20 0.34
▸ HDAC1 Q13547 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL28854299 0.81 CAMKK2 (0.46) TDP1MEN1LMNAKMT2ACAMKK2
SCHEMBL5520565 0.79 FEN1 (0.38) MEN1KMT2APTPN5PTPN2KDM4E
Ethane SCHEMBL28833111 0.78 TDP1 (0.42) TDP1MEN1LMNAKMT2APTPN5
Ethane SCHEMBL28092820 0.78 CA1 (0.52) MEN1LMNAKMT2APTGS2MAPT
SCHEMBL5531038 0.78 PTPN5 (0.36) MEN1KMT2APTPN5PTPN2KDM4E
SCHEMBL27711567 0.77 CA1 (0.54) MEN1LMNAKMT2APTGS2MAPT
SCHEMBL5530916 0.76 NUDT1 (0.40) MEN1KMT2APTPN5PTPN2PTGS2
SCHEMBL27546433 0.76 HSD17B1 (0.46) PTPN5PTPN2
SCHEMBL2515760 0.74 GABRA1 (0.34) TDP1MEN1LMNAKMT2APTPN5
SCHEMBL29484427 0.74 GABRA1 (0.34) TDP1MEN1LMNAKMT2APTPN5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107703685-A The manufacture method of layered product and layered product 东京应化工业株式会社 2018-02-16 — — CN disclosed
CN-107703658-A The manufacture method of substrate 东京应化工业株式会社 2018-02-16 — — CN disclosed
CN-107703717-A Positive type photosensitive organic compound, the manufacture method of metal line and layered product 东京应化工业株式会社 2018-02-16 — — CN disclosed
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