SCHEMBL28212447

SCHEMBL28212447

C=CC(=O)OC(C)=Cc1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.48
ALDH1A1 P00352 1/20 0.44
TSHR P16473 1/20 0.44
KMT2A Q03164 2/20 0.42
RECQL P46063 1/20 0.42
MEN1 O00255 1/20 0.42
HTT P42858 1/20 0.41
FBP1 P09467 1/20 0.41
GLA P06280 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
THRB P10828 1/20 0.40
AKR1C1 Q04828 1/20 0.39
MAPT P10636 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
AKT1 P31749 1/20 0.38
MTNR1A P48039 2/20 0.38
MTNR1B P49286 2/20 0.38
NPC1 O15118 1/20 0.38
POLB P06746 1/20 0.38
RAB9A P51151 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8508933 0.81 AKR1C3 (0.52) AKR1C3ALDH1A1TSHRKMT2ARECQL
SCHEMBL29894089 0.81 AKR1C3 (0.42) AKR1C3ALDH1A1TSHRKMT2ARECQL
SCHEMBL3248323 0.81 AKR1C3 (0.55) AKR1C3ALDH1A1TSHRKMT2ARECQL
SCHEMBL981803 0.81 AKR1C3 (0.55) AKR1C3ALDH1A1TSHRKMT2ARECQL
SCHEMBL756714 0.80 ALDH1A1 (0.52) AKR1C3ALDH1A1TSHRKMT2ARECQL
SCHEMBL29894009 0.79 AKR1C3 (0.42) AKR1C3ALDH1A1TSHRKMT2ARECQL
SCHEMBL6131328 0.79 AKR1C3 (0.48) AKR1C3ALDH1A1TSHRKMT2ARECQL
SCHEMBL213888 0.79 AKR1C3 (0.44) AKR1C3ALDH1A1TSHRKMT2ARECQL
SCHEMBL10500476 0.79 FBP1 (0.41) AKR1C3ALDH1A1TSHRKMT2AMEN1
SCHEMBL20585548 0.76 AKR1C3 (0.50) AKR1C3ALDH1A1TSHRKMT2ARECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117836927-A Resin cured film, semiconductor device, and method for manufacturing semiconductor device 株式会社力森诺科 2024-04-05 CN disclosed
CN-117280447-A Photosensitive resin composition selection method, pattern cured film production method, cured film, semiconductor device, and semiconductor device production method 株式会社力森诺科 2023-12-22 CN disclosed
CN-104238266-B Photosensitive resin composition, black matrix, color filter and liquid crystal display 奇美实业股份有限公司 2018-03-27 CN disclosed