SCHEMBL28217628

SCHEMBL28217628

CCOC(C(C)=O)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.36
LMNA P02545 2/20 0.36
HSD17B10 Q99714 1/20 0.36
FNTA P49354 1/20 0.35
FNTB P49356 1/20 0.35
THRB P10828 1/20 0.35
TDP1 Q9NUW8 2/20 0.33
CHRM1 P11229 1/20 0.33
AKR1A1 P14550 1/20 0.33
CHRM3 P20309 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33
ADRA1A P35348 1/20 0.33
HRH1 P35367 1/20 0.33
DRD3 P35462 1/20 0.33
SLC6A3 Q01959 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
PPARA Q07869 3/20 0.33
GRIK1 P39086 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28961945 0.98 LMNA (0.35) ALDH1A1LMNAHSD17B10FNTAFNTB
SCHEMBL6208557 0.87 THRB (0.40) ALDH1A1LMNAHSD17B10FNTAFNTB
SCHEMBL31135467 0.87 ALDH1A1 (0.41) ALDH1A1LMNAHSD17B10THRBTDP1
SCHEMBL10430515 0.80 FNTA (0.35) ALDH1A1LMNAHSD17B10FNTAFNTB
SCHEMBL5838162 0.78 LMNA (0.35) ALDH1A1LMNAHSD17B10THRB
SCHEMBL13592805 0.78 ALOX15 (0.39) ALDH1A1LMNAFNTAFNTBTHRB
SCHEMBL3908512 0.78 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10THRBPPARA
SCHEMBL5171313 0.78 FNTA (0.34) FNTAFNTB
SCHEMBL6028711 0.78 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10THRBPPARA
SCHEMBL5838168 0.78 ALOX15 (0.39) ALDH1A1LMNAHSD17B10THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107966879-B Composition for forming silicon-containing extreme ultraviolet resist underlayer film containing additive 日产化学工业株式会社 2021-06-01 CN disclosed
CN-104246614-B Composition for forming silicon-containing extreme ultraviolet resist underlayer film containing additive 日产化学工业株式会社 2020-09-08 CN disclosed
CN-108219833-A By the method for the hydrocarbon-fraction and sulfur-containing compound sulphurized catalyst of pre-hydrotreating IFP 新能源公司 2018-06-29 CN disclosed