SCHEMBL28231502

SCHEMBL28231502

CC(Cc1ccc(O)c(O)c1O)c1ccc(O)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 6/20 0.56
▸ ESR2 Q92731 5/20 0.56
▸ PDCD1 Q15116 1/20 0.42
▸ CD274 Q9NZQ7 1/20 0.42
▸ MIF P14174 1/20 0.41
▸ LMNA P02545 1/20 0.38
▸ CYP1A2 P05177 1/20 0.38
▸ PGR P06401 1/20 0.38
▸ CHRM2 P08172 1/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ ADORA3 P0DMS8 1/20 0.38
▸ AR P10275 1/20 0.38
▸ CYP2D6 P10635 1/20 0.38
▸ MAPT P10636 1/20 0.38
▸ CHRM1 P11229 1/20 0.38
▸ CYP2C9 P11712 1/20 0.38
▸ ALOX15 P16050 1/20 0.38
▸ DRD1 P21728 1/20 0.38
▸ TBXA2R P21731 1/20 0.38
▸ PTGS1 P23219 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5159407 0.80 ESR1 (0.58) ESR1ESR2PDCD1CD274MIF
SCHEMBL19902021 0.80 ESR1 (0.58) ESR1ESR2PDCD1CD274MIF
SCHEMBL30394315 0.77 ESR1 (0.64) ESR1ESR2PDCD1CD274MIF
SCHEMBL2472270 0.77 ESR1 (0.64) ESR1ESR2PDCD1CD274MIF
SCHEMBL6346017 0.77 GABRA1 (0.61) ESR1LMNACYP1A2PGRCYP3A4
SCHEMBL10706145 0.76 ESR1 (0.58) ESR1ESR2PDCD1CD274MIF
SCHEMBL1899586 0.76 ESR1 (0.68) ESR1ESR2PDCD1CD274LMNA
SCHEMBL7058427 0.75 ESR1 (0.51) ESR1ESR2PDCD1CD274MIF
SCHEMBL3235535 0.74 ESR1 (0.55) ESR1ESR2PDCD1CD274MIF
SCHEMBL296781 0.72 ESR1 (1.00) ESR1ESR2PDCD1CD274CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108884574-A Coating agent for forming metal oxide film and method for producing substrate having metal oxide film 东京应化工业株式会社 2018-11-23 — — CN disclosed
CN-102902157-B Glass processing method 东京应化工业株式会社 2018-07-27 — — CN disclosed
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