Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28379232 | 0.97 | MAPK1 (0.36) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL3182014 | 0.79 | MAPK1 (0.36) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL8578053 | 0.79 | MAPK1 (0.36) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL2819665 | 0.75 | TSHR (0.38) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL5369861 | 0.73 | MAPK1 (0.36) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL9253938 | 0.73 | ALDH1A1 (0.59) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL11788987 | 0.73 | MAPK1 (0.32) | MAPK1TSHRTDP1 | |
| SCHEMBL16074805 | 0.73 | TDP1 (0.43) | MAPK1TSHRTDP1ALDH1A1CYP2C19 | |
| SCHEMBL8623970 | 0.73 | MAPK1 (0.32) | MAPK1TSHRTDP1 | |
| SCHEMBL840436 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1317497-A4 | POLYESTER RESINS WITH IMPROVED PROPERTIES | POLYMERS AUSTRALIA PTY LTD (AU) | 2005-03-02 | — | — | EP | claimed |
| US-20040116619-A1 | Polyester resins with improved properties | POLYMERS AUSTRALIA PTY LIMITED (AU) | 2004-06-17 | — | — | US | claimed |
| EP-1317497-A1 | POLYESTER RESINS WITH IMPROVED PROPERTIES | Polymers Australia PTY Limited (AU) | 2003-06-11 | — | — | EP | claimed |
| WO-2002022705-A1 | POLYESTER RESINS WITH IMPROVED PROPERTIES | POLYMERS AUSTRALIA PTY LTD (AU) | 2002-03-21 | — | — | WO | claimed |
| CN-101313246-B | Radiation-sensitive resin composition | JSR CORP | 2012-10-03 | — | — | CN | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| EP-1182506-B1 | Crosslinked positive-working photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| CN-101313246-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-26 | — | — | CN | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-7364831-B2 | Positive resist composition and resist pattern formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-29 | — | — | US | disclosed |
| US-20070004816-A1 | Photocurable resin composition | DSM IP ASSETS B.V. (NL) | 2007-01-04 | — | — | US | disclosed |
| US-20020045133-A1 | Method for the preparation of a semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-04-18 | — | — | US | disclosed |
| WO-2002022705-A1 | POLYESTER RESINS WITH IMPROVED PROPERTIES | POLYMERS AUSTRALIA PTY LTD (AU) | 2002-03-21 | — | — | WO | disclosed |
| US-20020034704-A1 | Crosslinked positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-03-21 | — | — | US | disclosed |
| EP-1182506-A1 | Crosslinked positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-02-27 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| US-6120972-A | COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |