Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2826341 | 0.79 | MAPK1 (0.38) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL28379232 | 0.77 | MAPK1 (0.36) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL8578053 | 0.77 | MAPK1 (0.36) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL2819665 | 0.72 | TSHR (0.38) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL9253938 | 0.71 | ALDH1A1 (0.59) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL5369861 | 0.71 | MAPK1 (0.36) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL11788987 | 0.70 | MAPK1 (0.32) | MAPK1TSHRTDP1 | |
| SCHEMBL16074805 | 0.70 | TDP1 (0.43) | MAPK1TSHRTDP1ALDH1A1 | |
| SCHEMBL8623970 | 0.70 | MAPK1 (0.32) | MAPK1TSHRTDP1 | |
| SCHEMBL840436 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-20070004816-A1 | Photocurable resin composition | DSM IP ASSETS B.V. (NL) | 2007-01-04 | — | — | US | disclosed |
| EP-1634124-A1 | PHOTOCURABLE RESIN COMPOSITION | DSM IP Assets B.V. (NL) | 2006-03-15 | — | — | EP | disclosed |
| WO-2004111733-A1 | PHOTOCURABLE RESIN COMPOSITION | DSM IP ASSETS B.V. (NL) | 2004-12-23 | — | — | WO | disclosed |
| EP-0901043-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-10-27 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| US-6120972-A | COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |