⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11965873 | 0.85 | ALOX15 (0.33) | — | |
| SCHEMBL29927650 | 0.81 | KDM4E (0.33) | — | |
| SCHEMBL14915031 | 0.81 | — | — | |
| SCHEMBL74548 | 0.80 | ALDH1A1 (0.31) | — | |
| SCHEMBL1719124 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL1719122 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL91209 | 0.77 | ALDH1A1 (0.30) | — | |
| SCHEMBL10540652 | 0.76 | HCAR2 (0.35) | — | |
| SCHEMBL14360404 | 0.75 | L3MBTL1 (0.31) | — | |
| SCHEMBL4733294 | 0.73 | PRKD3 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110658678-B | Photoresist top coat composition and method for processing photoresist composition | 罗门哈斯电子材料有限责任公司 | 2024-05-17 | — | — | CN | disclosed |
| US-11940731-B2 | Photoresist topcoat compositions and methods of processing photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2024-03-26 | — | — | US | disclosed |
| US-11846885-B2 | Topcoat compositions and photolithographic methods | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2023-12-19 | — | — | US | disclosed |
| CN-116859669-A | Photoresist topcoat composition and method of treating photoresist composition | 罗门哈斯电子材料有限责任公司 | 2023-10-10 | — | — | CN | disclosed |
| US-20230251575-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-08-10 | — | — | US | disclosed |
| EP-3659802-B1 | LAYERED/EXTRUDED RESIN SHEET, AND PROTECTIVE SHEET FOR LIQUID CRYSTAL DISPLAY WITH INFRARED SENSOR | KURARAY CO (JP) | 2023-07-12 | — | — | EP | disclosed |
| CN-116376387-A | Photoresist top-coat composition and pattern forming method | 罗门哈斯电子材料有限责任公司 | 2023-07-04 | — | — | CN | disclosed |
| US-11567408-B2 | Coating composition for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-01-31 | — | — | US | disclosed |
| CN-111983745-B | Optical film, polarizing plate and liquid crystal display device | 柯尼卡美能达株式会社 | 2022-10-21 | — | — | CN | disclosed |
| US-20220214619-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC | 2022-07-07 | — | — | US | disclosed |
| US-20050208418-A1 | Cyanoadamantyl compounds and polymers | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-09-22 | — | — | US | disclosed |
| WO-2005086901-A2 | CYNOADAMANTYL COMPOUND AND POLYMERS AND PHOTORESISTS COMPRESING SAME | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-09-22 | — | — | WO | disclosed |
| US-20050208417-A1 | Cyanoadamantyl compounds and polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-09-22 | — | — | US | disclosed |
| EP-1574903-A1 | Photoresists comprising cyanoadamantyl moiety-containing polymers | Rohm and Haas Electronic Materials, L.L.C. (US) | 2005-09-14 | — | — | EP | disclosed |
| US-20040076906-A1 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. | 2004-04-22 | — | — | US | disclosed |
| US-6692888-B1 | TERPOLYMER OF SUCH AS 2-METHYLADAMANTANYL METHACRYLATE, METHACRYLONITRILE AND ALPHA-BUTYROLACTONE METHACRYLATE; SHORT WAVELENGTH IMAGING; PLASMA ETCHANT RESISTANCE | SHIPLEY COMPANY, L.L.C. | 2004-02-17 | — | — | US | disclosed |
| US-20030207200-A1 | Phenolic/alicyclic copolymers and photoresists | SHIPLEY COMPANY, L.L.C. (US) | 2003-11-06 | — | — | US | disclosed |
| US-6492086-B1 | TERPOLYMERS OF M- AND P-HYDROXYSTYRENE AND ACRYLIC ESTER OF ALKYLADAMANTYL, ETHYLFENCYL, TRICYCLO DECANYL, OR PINANYL GROUP; IMAGING AT SHORT WAVELENGTHS; HIGH RESOLUTION RELIEF IMAGES | SHIPLEY COMPANY, L.L.C. | 2002-12-10 | — | — | US | disclosed |
| EP-1091249-A1 | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |