SCHEMBL28286158

SCHEMBL28286158

C=Cc1nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n1.COc1cccc(OC)c1OC

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.36
NFE2L2 Q16236 4/20 0.35
DCPS Q96C86 1/20 0.35
KDM4E B2RXH2 3/20 0.35
MAPT P10636 3/20 0.35
ALDH1A1 P00352 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
DHFR P00374 2/20 0.34
NTSR1 P30989 1/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
TUBB4A P04350 2/20 0.34
TUBB P07437 2/20 0.34
TUBA3C P0DPH7 2/20 0.34
TUBA1B P68363 2/20 0.34
TUBA4A P68366 2/20 0.34
TUBB4B P68371 2/20 0.34
TUBB3 Q13509 2/20 0.34
TUBB2A Q13885 2/20 0.34
TUBB8 Q3ZCM7 2/20 0.34
TUBA3E Q6PEY2 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6330998 0.76 ADORA2A (0.47) HSD17B10KDM4EMAPTALDH1A1TDP1
SCHEMBL11815688 0.75
SCHEMBL147174 0.73 CYP1A1 (0.51) MAPTTUBB4ATUBBTUBA3CTUBA1B
SCHEMBL147173 0.73 CYP1A1 (0.51) MAPTTUBB4ATUBBTUBA3CTUBA1B
SCHEMBL147046 0.72 NFE2L2 (0.50) NFE2L2KDM4EMAPTALDH1A1DHFR
SCHEMBL147047 0.72 NFE2L2 (0.50) NFE2L2KDM4EMAPTALDH1A1DHFR
SCHEMBL29402166 0.72 NFE2L2 (0.50) NFE2L2KDM4EMAPTALDH1A1DHFR
SCHEMBL28856569 0.70 NFE2L2 (0.48) HSD17B10NFE2L2KDM4EMAPTALDH1A1
SCHEMBL25404318 0.70 PDE3B (0.38) NFE2L2KDM4EMAPTALDH1A1NPC1
SCHEMBL9625984 0.70 MAPT (0.40) HSD17B10KDM4EMAPTALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103988127-B Photosensitive resin composition, method for producing cured relief pattern, semiconductor device, and display device 旭化成株式会社 2019-04-19 CN disclosed