SCHEMBL147046

SCHEMBL147046

COc1ccccc1/C=C/c1nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 5/20 0.50
TRPA1 O75762 1/20 0.50
CYP1A1 P04798 3/20 0.46
CYP1A2 P05177 3/20 0.46
CYP1B1 Q16678 3/20 0.46
CYP19A1 P11511 1/20 0.45
DHFR P00374 1/20 0.45
TFEB P19484 1/20 0.44
KDM4E B2RXH2 2/20 0.43
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
PTGS1 P23219 3/20 0.43
PTGS2 P35354 3/20 0.43
ALDH1A1 P00352 1/20 0.43
ALOX5 P09917 1/20 0.42
ABL1 P00519 2/20 0.42
LCK P06239 2/20 0.42
LYN P07948 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL147047 1.00 NFE2L2 (0.50) NFE2L2TRPA1CYP1A1CYP1A2CYP1B1
SCHEMBL29402166 1.00 NFE2L2 (0.50) NFE2L2TRPA1CYP1A1CYP1A2CYP1B1
SCHEMBL153283 0.92 DHFR (0.50) NFE2L2TRPA1CYP1A1CYP1A2CYP1B1
SCHEMBL25801382 0.92 NFE2L2 (0.45) NFE2L2TRPA1CYP1A1CYP1A2CYP1B1
SCHEMBL9625468 0.86 KDM4E (0.52) KDM4ENPC1RAB9AMEN1KMT2A
SCHEMBL28754044 0.86 NFE2L2 (0.45) NFE2L2TRPA1CYP1A1CYP1A2CYP1B1
SCHEMBL11554723 0.86 NFE2L2 (0.45) NFE2L2TRPA1CYP1A1CYP1A2CYP1B1
SCHEMBL8570242 0.84 KMT2A (0.45) CYP1A2KDM4ENPC1RAB9AMEN1
SCHEMBL8570243 0.84 KMT2A (0.45) CYP1A2KDM4ENPC1RAB9AMEN1
SCHEMBL15471666 0.84 CYP1A1 (0.49) NFE2L2TRPA1CYP1A1CYP1A2CYP1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 295 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11697744-B2 High impact strength 3D printing materials derived from polycycloolefin monomers and crosslinkers PROMERUS, LLC (US) 2023-07-11 US claimed
US-20220010157-A1 HIGH IMPACT STRENGTH 3D PRINTING MATERIALS DERIVED FROM POLYCYCLOOLEFIN MONOMERS AND CROSSLINKERS PROMERUS, LLC (US) 2022-01-13 US claimed
US-12622847-B2 Organosilicon compound and dental composition containing same KURARAY NORITAKE DENTAL INC. (JP) 2026-05-12 US disclosed
US-12478562-B2 Dental restoration material composition KURARAY NORITAKE DENTAL INC. (JP) 2025-11-25 US disclosed
US-12465559-B2 Fluorescent curable dental composition and cured product thereof KURARAY NORITAKE DENTAL INC. (JP) 2025-11-11 US disclosed
US-20250213434-A1 DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY KURARAY NORITAKE DENTAL INC. (JP) 2025-07-03 US disclosed
US-20250207005-A1 ADHESIVE COMPOSITION FOR STEREOLITHOGRAPHIC ARTICLE AND NON-STEREOLITHOGRAPHIC ARTICLE KURARAY NORITAKE DENTAL INC. (JP) 2025-06-26 US disclosed
WO-2025126917-A1 DENTAL COMPOSITION クラレノリタケデンタル株式会社 2025-06-19 WO disclosed
WO-2025033522-A1 CURABLE COMPOSITION FOR DENTAL USE クラレノリタケデンタル株式会社 2025-02-13 WO disclosed
EP-4505992-A1 DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY Kuraray Noritake Dental Inc. (JP) 2025-02-12 EP disclosed
EP-4501306-A1 ADHESIVE COMPOSITION FOR STEREOLITHOGRAPHIC ARTICLE AND NON-STEREOLITHOGRAPHIC ARTICLE Kuraray Noritake Dental Inc. (JP) 2025-02-05 EP disclosed
US-6245478-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-06-12 US disclosed
US-6239231-B1 HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS SUMITOMO CHEMICAL, COMPANY LIMITED (JP) 2001-05-29 US disclosed
US-6183934-B1 FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE KABUSHIKI KAISHA TOSHIBA (JP) 2001-02-06 US disclosed
US-6133338-A TYPIFIED BY 6-METHACRYLOYLOXYHEXYL 2-THIOURACIL-5-CARBOXYLATE, A RADICAL-POLYMERIZABLE MONOMER, AND A POLYMERIZATION INITIATOR; DENTAL ADHESIVE; GOOD ADHESIVENESS TO NOBLE METALS AND ALLOYS THEREOF TOKUYAMA CORPORATION (JP) 2000-10-17 US disclosed
EP-0982628-A2 A chemical amplifying type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-03-01 EP disclosed
EP-0917000-A2 Positive resist composition and method for forming a resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-05-19 EP disclosed
EP-0896043-A1 Adhesive TOKUYAMA CORPORATION (JP) 1999-02-10 EP disclosed
EP-0856773-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1998-08-05 EP disclosed
US-5059698-A Solution inhibitors for positive photoresists; light-curable polymers CIBA-GEIGY CORPORATION (US) 1991-10-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12465559-B2 Fluorescent curable dental composition and cured product thereof BRD1, TBCA, BAZ1A NFE2L2 2929/4885TRPA1 303/4885CYP1A1 3395/4885
US-20250207005-A1 ADHESIVE COMPOSITION FOR STEREOLITHOGRAPHIC ARTICLE AND NON-STEREOLITHOGRAPHIC ARTICLE ACR, CAD, ALG3 NFE2L2 4843/4885TRPA1 888/4885CYP1A1 1567/4885
US-12478562-B2 Dental restoration material composition CAD, MAT2B, RER1 NFE2L2 1869/4885TRPA1 666/4885CYP1A1 340/4885
US-12622847-B2 Organosilicon compound and dental composition containing same MSL1, ITGA1, ITGAL NFE2L2 1622/4885TRPA1 1084/4885CYP1A1 403/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.