SCHEMBL6330998

SCHEMBL6330998

COc1cccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)c1OC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADORA2A P29274 3/20 0.47
ADORA3 P0DMS8 2/20 0.47
ADORA2B P29275 2/20 0.47
TP53 P04637 5/20 0.45
MAPT P10636 4/20 0.45
SMN1; SMN2 Q16637 4/20 0.45
ALDH1A1 P00352 4/20 0.45
RAB9A P51151 3/20 0.45
NPC1 O15118 2/20 0.45
KDM4E B2RXH2 4/20 0.45
TDP1 Q9NUW8 1/20 0.45
HSD17B10 Q99714 3/20 0.44
TUBB4A P04350 3/20 0.43
TUBB P07437 3/20 0.43
TUBA3C P0DPH7 3/20 0.43
TUBA1B P68363 3/20 0.43
TUBA4A P68366 3/20 0.43
TUBB4B P68371 3/20 0.43
TUBB3 Q13509 3/20 0.43
TUBB2A Q13885 3/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29353355 0.85 ALDH1A1 (0.47) ADORA3TP53SMN1; SMN2ALDH1A1RAB9A
SCHEMBL649415 0.85 ALDH1A1 (0.47) ADORA3TP53SMN1; SMN2ALDH1A1RAB9A
SCHEMBL393466 0.84 CYP1A2 (0.40) ADORA2ATP53MAPTSMN1; SMN2ALDH1A1
SCHEMBL8605518 0.84 ADORA2A (0.41) ADORA2AADORA3ADORA2BTP53MAPT
SCHEMBL7620478 0.83 ADORA2A (0.56) ADORA2AADORA3ADORA2BTP53MAPT
SCHEMBL390360 0.78 PPARG (0.41) TP53MAPTSMN1; SMN2ALDH1A1RAB9A
SCHEMBL28286158 0.76 HSD17B10 (0.36) MAPTSMN1; SMN2ALDH1A1NPC1KDM4E
SCHEMBL10344664 0.75 ALDH1A1 (0.41) TP53MAPTSMN1; SMN2ALDH1A1RAB9A
SCHEMBL29350011 0.75 IDO1 (0.42) TP53MAPTSMN1; SMN2ALDH1A1RAB9A
SCHEMBL62367 0.75 IDO1 (0.42) TP53MAPTSMN1; SMN2ALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6899999-B2 Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member KABUSHIKI KAISHA TOSHIBA (JP) 2005-05-31 US disclosed
US-20030022102-A1 Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member KABUSHIKI KAISHA TOSHIBA (JP) 2003-01-30 US disclosed