SCHEMBL28299042

SCHEMBL28299042

O=[N+]([O-])c1ccc(Cc2ccccc2S(=O)(=O)O)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA9 Q16790 1/20 0.47
CA14 Q9ULX7 1/20 0.47
POLB P06746 1/20 0.45
TSHR P16473 1/20 0.44
ALDH1A1 P00352 2/20 0.43
MAPT P10636 2/20 0.43
KDM4E B2RXH2 1/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
CYP2C19 P33261 2/20 0.43
CYP1A2 P05177 1/20 0.43
HTT P42858 1/20 0.42
LOXL2 Q9Y4K0 1/20 0.42
MMP1 P03956 1/20 0.42
MMP2 P08253 1/20 0.42
MMP9 P14780 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4661774 0.85 CA2 (0.57) CA12CA1CA2CA9CA14
SCHEMBL28277948 0.84 ALDH1A1 (0.55) POLBALDH1A1MAPTKDM4EMEN1
SCHEMBL6553330 0.80 ACHE (0.46) CA12CA1CA2CA9CA14
SCHEMBL1607271 0.80 ACHE (0.46) CA12CA1CA2CA9CA14
SCHEMBL29740732 0.80 BCL2 (0.50) TSHRSMN1; SMN2CYP1A2MMP1MMP2
SCHEMBL7738158 0.80 BCL2 (0.50) TSHRSMN1; SMN2CYP1A2MMP1MMP2
SCHEMBL28311621 0.78 CA12 (0.56) CA12CA1CA2CA9CA14
SCHEMBL27522422 0.78 KEAP1 (0.59) CA12CA1CA2CA9CA14
Diphenylmethane SCHEMBL9099577 0.76 CA2 (0.54) CA12CA1CA2CA9CA14
SCHEMBL14991455 0.76 MYC (0.47) CA1CA2CA9TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109709770-A The manufacturing method of resin combination, dry film and manufacturing method, resist film and substrate and plating forming object, sulfhydryl compound 东京应化工业株式会社 2019-05-03 CN disclosed
CN-103941547-B Hard mask is surface-treated 罗门哈斯电子材料有限公司 2018-07-27 CN disclosed