SCHEMBL28307209

SCHEMBL28307209

Nc1cc(NC(=O)c2ccc(C(=O)O)c(N)c2)ccc1C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.54
PKM P14618 4/20 0.54
MEN1 O00255 3/20 0.51
PYGL P06737 1/20 0.51
TDP1 Q9NUW8 2/20 0.49
POLB P06746 2/20 0.49
LMNA P02545 1/20 0.49
APEX1 P27695 1/20 0.49
KDM4E B2RXH2 3/20 0.47
MAPT P10636 2/20 0.47
NPC1 O15118 1/20 0.47
RAB9A P51151 1/20 0.47
RARA P10276 1/20 0.47
RARB P10826 1/20 0.47
RARG P13631 1/20 0.47
HPSE Q9Y251 2/20 0.47
TOP1 P11387 1/20 0.46
SIRT6 Q8N6T7 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.45
NR1H4 Q96RI1 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29512871 0.90 KMT2A (0.64) KMT2APKMMEN1PYGLTDP1
SCHEMBL10916423 0.89 BCAT2 (0.57) KMT2APKMMEN1TDP1POLB
SCHEMBL11485725 0.89 HDAC2 (0.58) KMT2APKMMEN1POLBLMNA
SCHEMBL11776642 0.89 KMT2A (0.69) KMT2APKMMEN1TDP1POLB
SCHEMBL11778498 0.88 PRSS12 (0.54) KMT2AMEN1PYGLKDM4EMAPT
SCHEMBL10913147 0.84 PARP1 (0.56) KMT2APKMMEN1POLBHPSE
SCHEMBL28308170 0.83 KMT2A (0.51) KMT2APKMMEN1TDP1POLB
SCHEMBL10916332 0.83 PGR (0.62) KMT2AMEN1TDP1HPSEL3MBTL1
SCHEMBL11325167 0.82 KMT2A (0.55) KMT2APKMMEN1TDP1POLB
SCHEMBL6426034 0.81 KMT2A (0.58) KMT2APKMMEN1TDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110050013-B Method for producing release layer 日产化学株式会社 2022-11-29 CN disclosed
CN-110050013-A The manufacturing method of peeling layer 日产化学株式会社 2019-07-23 CN disclosed