Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL701492 | 1.00 | THRB (0.33) | THRBCYP2C9MAPTEPHX1GLA | |
| SCHEMBL14801409 | 0.83 | THRB (0.33) | THRBCYP2C9MAPTEPHX1GLA | |
| SCHEMBL6744611 | 0.83 | THRB (0.33) | THRBCYP2C9MAPTEPHX1GLA | |
| SCHEMBL2221255 | 0.82 | THRB (0.33) | THRBCYP2C9 | |
| SCHEMBL6559871 | 0.81 | THRB (0.32) | THRBCYP2C9 | |
| SCHEMBL701564 | 0.80 | THRB (0.31) | THRBCYP2C9 | |
| SCHEMBL701560 | 0.80 | SMN1; SMN2 (0.31) | THRBCYP2C9EPHX1 | |
| SCHEMBL1482224 | 0.80 | THRB (0.31) | THRBCYP2C9 | |
| SCHEMBL13835744 | 0.78 | THRB (0.30) | THRBCYP2C9 | |
| SCHEMBL701766 | 0.77 | EPHX2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1845415-B1 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ ELECTRONIC MATERIALS USA (US) | 2014-04-30 | — | — | EP | claimed |
| EP-2527380-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-12-18 | — | — | EP | claimed |
| EP-2341089-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-02-13 | — | — | EP | claimed |
| EP-1466216-B1 | PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION | AZ ELECTRONIC MATERIALS USA (US) | 2006-07-26 | — | — | EP | claimed |
| US-20030207200-A1 | Phenolic/alicyclic copolymers and photoresists | SHIPLEY COMPANY, L.L.C. (US) | 2003-11-06 | — | — | US | claimed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | claimed |
| US-9557646-B2 | Phenolic polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-31 | — | — | US | disclosed |
| US-20150355542-A1 | PHENOLIC POLYMERS AND PHOTORESISTS COMPRISING SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-12-10 | — | — | US | disclosed |
| EP-2829532-A1 | Hydroxyphenyl acrylate monomers and polymers | Rohm and Haas Company (US) | 2015-01-28 | — | — | EP | disclosed |
| US-8932793-B2 | Phenolic polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-13 | — | — | US | disclosed |
| US-7700256-B2 | Phenolic/alicyclic copolymers and photoresists | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-04-20 | — | — | US | disclosed |
| EP-1970762-B1 | Phenolic polymers and photoresists comprising same | ROHM & HAAS ELECT MAT (US) | 2009-12-16 | — | — | EP | disclosed |
| US-20080227031-A1 | Phenolic polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-09-18 | — | — | US | disclosed |
| US-20040018442-A1 | Resist composition comprising photosensitive polymer having lactone in its backbone | YOON KWANG-SUB (KR) | 2004-01-29 | — | — | US | disclosed |
| US-20030232274-A1 | Photoacid-labile polymers and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2003-12-18 | — | — | US | disclosed |
| US-20030207200-A1 | Phenolic/alicyclic copolymers and photoresists | SHIPLEY COMPANY, L.L.C. (US) | 2003-11-06 | — | — | US | disclosed |
| US-6537727-B2 | Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-03-25 | — | — | US | disclosed |
| US-6492086-B1 | TERPOLYMERS OF M- AND P-HYDROXYSTYRENE AND ACRYLIC ESTER OF ALKYLADAMANTYL, ETHYLFENCYL, TRICYCLO DECANYL, OR PINANYL GROUP; IMAGING AT SHORT WAVELENGTHS; HIGH RESOLUTION RELIEF IMAGES | SHIPLEY COMPANY, L.L.C. | 2002-12-10 | — | — | US | disclosed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | disclosed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |