SCHEMBL701492

SCHEMBL701492

CC(=CC12CC3CC(CC(C3)C1C)C2)C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.33
CYP2C9 P11712 1/20 0.33
MAPT P10636 1/20 0.30
EPHX1 P07099 1/20 0.30
GLA P06280 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2832305 1.00 THRB (0.33) THRBCYP2C9MAPTEPHX1GLA
SCHEMBL14801409 0.83 THRB (0.33) THRBCYP2C9MAPTEPHX1GLA
SCHEMBL6744611 0.83 THRB (0.33) THRBCYP2C9MAPTEPHX1GLA
SCHEMBL2221255 0.82 THRB (0.33) THRBCYP2C9
SCHEMBL6559871 0.81 THRB (0.32) THRBCYP2C9
SCHEMBL701564 0.80 THRB (0.31) THRBCYP2C9
SCHEMBL701560 0.80 SMN1; SMN2 (0.31) THRBCYP2C9EPHX1
SCHEMBL1482224 0.80 THRB (0.31) THRBCYP2C9
SCHEMBL13835744 0.78 THRB (0.30) THRBCYP2C9
SCHEMBL701766 0.77 EPHX2 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1845415-B1 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA (US) 2014-04-30 EP claimed
EP-2527380-B1 Photosensitive compositions ROHM & HAAS ELECT MAT (US) 2013-12-18 EP claimed
EP-2341089-B1 Photosensitive compositions ROHM & HAAS ELECT MAT (US) 2013-02-13 EP claimed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
EP-1466216-B1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA (US) 2006-07-26 EP claimed
US-20030207200-A1 Phenolic/alicyclic copolymers and photoresists SHIPLEY COMPANY, L.L.C. (US) 2003-11-06 US claimed
EP-1091250-A1 Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same Shipley Company LLC (US) 2001-04-11 EP claimed
US-20240045329-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND TORAY INDUSTRIES, INC. (JP) 2024-02-08 US disclosed
CN-109843853-B Composition and method for manufacturing device using the same 东洋合成工业株式会社 2022-09-20 CN disclosed
US-11142495-B2 Composition and method for manufacturing device using same TOYO GOSEI CO., LTD. (JP) 2021-10-12 US disclosed
EP-2016464-B1 NEGATIVE PHOTORESIST COMPOSITIONS MERCK PATENT GMBH (DE) 2021-04-28 EP disclosed
EP-3394674-B1 NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) 2020-05-06 EP disclosed
US-20200048191-A1 COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME TOYO GOSEI CO., LTD. (JP) 2020-02-13 US disclosed
US-20030232274-A1 Photoacid-labile polymers and photoresists comprising same SHIPLEY COMPANY, L.L.C. 2003-12-18 US disclosed
US-20030207200-A1 Phenolic/alicyclic copolymers and photoresists SHIPLEY COMPANY, L.L.C. (US) 2003-11-06 US disclosed
US-6537727-B2 Improved dry etching resistance, adhesiveness to underlying material layers, line edge roughness of line patterns, contrast characteristics SAMSUNG ELECTRONICS CO., LTD. (KR) 2003-03-25 US disclosed
US-6492086-B1 TERPOLYMERS OF M- AND P-HYDROXYSTYRENE AND ACRYLIC ESTER OF ALKYLADAMANTYL, ETHYLFENCYL, TRICYCLO DECANYL, OR PINANYL GROUP; IMAGING AT SHORT WAVELENGTHS; HIGH RESOLUTION RELIEF IMAGES SHIPLEY COMPANY, L.L.C. 2002-12-10 US disclosed
US-20020042016-A1 Resist composition comprising photosensitive polymer having loctone in its backbone SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-04-11 US disclosed
US-6365771-B1 CURABLE VINYL ETHER OR METHACRYLATE DERIVATIVES OF 4,7 METHANOINDENE OR INDANE; PHOTORESISTS, OPTICS, AND COATINGS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2002-04-02 US disclosed
EP-1091250-A1 Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same Shipley Company LLC (US) 2001-04-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200048191-A1 COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME LBR, LMTK2, MMS19 THRB 4482/4885CYP2C9 3085/4885MAPT 750/4885
US-11142495-B2 Composition and method for manufacturing device using same LBR, LMTK2, MMS19 THRB 4482/4885CYP2C9 3085/4885MAPT 750/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.