SCHEMBL701560

SCHEMBL701560

CC(=CC12CC3CC(CC(C3)C1C(C)C)C2)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.31
EPHX2 P34913 2/20 0.31
EPHX1 P07099 1/20 0.31
NPC1 O15118 1/20 0.31
ALDH1A1 P00352 1/20 0.31
THRB P10828 1/20 0.31
CYP2C9 P11712 1/20 0.31
CA2 P00918 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL701492 0.80 THRB (0.33) EPHX1THRBCYP2C9
SCHEMBL14801409 0.80 THRB (0.33) EPHX1NPC1THRBCYP2C9
SCHEMBL6744611 0.80 THRB (0.33) EPHX1NPC1THRBCYP2C9
SCHEMBL2832305 0.80 THRB (0.33) EPHX1THRBCYP2C9
SCHEMBL6559871 0.77 THRB (0.32) THRBCYP2C9
SCHEMBL701564 0.76 THRB (0.31) SMN1; SMN2THRBCYP2C9
SCHEMBL1482224 0.76 THRB (0.31) SMN1; SMN2THRBCYP2C9
SCHEMBL701766 0.74 EPHX2 (0.31) EPHX2ALDH1A1
SCHEMBL14798101 0.72 THRB (0.32) THRBCYP2C9
SCHEMBL3869669 0.71 EPHX2 (0.35) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-8808974-B2 Method for forming pattern JSR CORPORATION (JP) 2014-08-19 US disclosed
US-20140162190-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2014-06-12 US disclosed
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed