SCHEMBL2834162

SCHEMBL2834162

[CH2]c1ccccc1SCC

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ S100A4 P26447 2/20 0.35
▸ MAP2K7 O14733 1/20 0.35
▸ CDC25A P30304 1/20 0.35
▸ CDC25B P30305 1/20 0.35
▸ ALDH1A1 P00352 4/20 0.35
▸ LMNA P02545 2/20 0.35
▸ HTT P42858 2/20 0.35
▸ RXFP1 Q9HBX9 2/20 0.35
▸ KDM4E B2RXH2 1/20 0.35
▸ GLA P06280 1/20 0.35
▸ GAA P10253 1/20 0.35
▸ ADRA2A P08913 2/20 0.35
▸ ADRA2B P18089 2/20 0.35
▸ ADRA2C P18825 2/20 0.35
▸ ADRA1D P25100 2/20 0.35
▸ ADRA1A P35348 2/20 0.35
▸ ADRA1B P35368 2/20 0.35
▸ NPC1 O15118 1/20 0.35
▸ ATM Q13315 1/20 0.35
▸ BCHE P06276 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2959162 0.82 PTGS2 (0.47) ALDH1A1LMNAKDM4ENPC1HPGD
SCHEMBL9793625 0.82 S100A4 (0.41) S100A4MAP2K7CDC25ACDC25BALDH1A1
SCHEMBL2974208 0.79 PTGS2 (0.51) S100A4ALDH1A1LMNAHTTNPC1
SCHEMBL4268182 0.77 FBP1 (0.37) NPSR1MAPT
SCHEMBL9410488 0.75 APOBEC3G (0.41) S100A4MAP2K7CDC25ACDC25BALDH1A1
SCHEMBL30958568 0.75 NPC1 (0.47) S100A4MAP2K7CDC25ACDC25BALDH1A1
SCHEMBL2857496 0.73 MEN1 (0.58) ALDH1A1LMNAHTTNPC1HSD17B10
SCHEMBL5609829 0.73 S100A4 (0.41) S100A4MAP2K7CDC25ACDC25BALDH1A1
SCHEMBL29565819 0.73 MEN1 (0.58) ALDH1A1LMNAHTTNPC1HSD17B10
SCHEMBL3883291 0.73 MCHR1 (0.47) S100A4MAP2K7CDC25ACDC25BALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110806677-A Photoresist composition, pattern forming method and application thereof 常州强力先端电子材料有限公司 2020-02-18 — — CN claimed
US-6096836-A OXYGEN CONTAINING AROMATIC CATALYST AND ALUMINUM COMPOUND KABUSHIKI KAISHA TOSHIBA (JP) 2000-08-01 — — US claimed
US-4591376-A PLANT GROWTH REGULATORS SCHERING AKTIENGESELLSCHAFT (DE) 1986-05-27 — — US claimed
EP-0126234-A2 1,2,3-Thiadiazol-3-in-5-ylidene ureas, their preparation and compositions as plant-growth regulators and defoliants SCHERING AKTIENGESELLSCHAFT (DE) 1984-11-28 — — EP claimed
CN-114516863-B Imide sulfonate photoacid generator with high acid yield, composition and application 常州强力电子新材料股份有限公司 2024-06-21 — — CN disclosed
CN-115368285-B oxime sulfonate photoacid generator with high acid yield 常州强力先端电子材料有限公司 2024-03-26 — — CN disclosed
CN-115368286-B Oxime sulfonate photoacid generator with high acid yield 常州强力先端电子材料有限公司 2024-03-22 — — CN disclosed
CN-115368287-B I-line oxime sulfonate photoacid generator with high acid yield 常州强力先端电子材料有限公司 2024-03-19 — — CN disclosed
CN-115368340-B Oxime sulfonate photoacid generator, resist composition containing oxime sulfonate photoacid generator, electronic device and application of oxime sulfonate photoacid generator 常州强力先端电子材料有限公司 2024-01-26 — — CN disclosed
CN-115368341-B Oxime sulfonate compound, resist composition containing oxime sulfonate compound, electronic device and application of oxime sulfonate compound 常州强力先端电子材料有限公司 2024-01-26 — — CN disclosed
CN-116283945-A Imide sulfonate photoacid generator, resist composition, application thereof and electronic component 瑞红(苏州)电子化学品股份有限公司 2023-06-23 — — CN disclosed
US-20230194987-A1 PHOTORESIST POLYMER AND PHOTORESIST COMPOSITION INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-06-22 — — US disclosed
US-4414210-A 2-Hydroxyarylethyltriazole fungicides ROHM AND HAAS COMPANY (US) 1983-11-08 — — US disclosed
US-4413003-A FUNGICIDES ROHM AND HAAS COMPANY (US) 1983-11-01 — — US disclosed
US-4379838-A Photosensitive photographic recording material comprising a dyed layer AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) 1983-04-12 — — US disclosed
US-4353972-A ACRYLIC ESTER POLYMER CONTAINING QUATERNARY AMMONIUM OR PHOSPHONIUM GROUPS AGFA-GEVAERT AG (DE) 1982-10-12 — — US disclosed
EP-0060438-A2 Dye preparation Agfa-Gevaert AG (DE) 1982-09-22 — — EP disclosed
EP-0027231-B1 PHOTOGRAPHIC MATERIAL COMPRISING A MORDANT LAYER Agfa-Gevaert AG (DE) 1982-05-19 — — EP disclosed
EP-0027231-A1 Photographic material comprising a mordant layer Agfa-Gevaert AG (DE) 1981-04-22 — — EP disclosed
US-3957928-A S-AMMONIUM-O-HYDROCARBYL-N-ACYL PHOSPHORAMIDOTHIOATE SALT PRODUCTION AND REACTION WITH ALKYLATING AGENT CHEVRON RESEARCH COMPANY (US) 1976-05-18 — — US disclosed
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