SCHEMBL28384098

SCHEMBL28384098

CCOc1cc(-c2ccccc2)c2ccccc2c1-c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALOX5 P09917 1/20 0.44
▸ ADORA1 P30542 3/20 0.43
▸ ADORA2A P29274 3/20 0.43
▸ ADORA3 P0DMS8 1/20 0.43
▸ ALDH1A1 P00352 4/20 0.42
▸ MAPT P10636 2/20 0.42
▸ SMN1; SMN2 Q16637 1/20 0.42
▸ CDK5 Q00535 1/20 0.41
▸ CDK5R1 Q15078 1/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ EGFR P00533 1/20 0.39
▸ PTPRC P08575 1/20 0.39
▸ KDM4E B2RXH2 2/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ GLA P06280 1/20 0.39
▸ NPC1 O15118 1/20 0.38
▸ RAB9A P51151 1/20 0.38
▸ HSD17B10 Q99714 1/20 0.38
▸ GPR84 Q9NQS5 1/20 0.38
▸ TTK P33981 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28383922 0.88 PTGDR2 (0.43) ALOX5ADORA1ADORA2AADORA3ALDH1A1
SCHEMBL13511558 0.80 ACACA (0.50) MAPTSMN1; SMN2NPC1RAB9AGPR84
SCHEMBL28614949 0.78 ADORA1 (0.47) ALOX5ADORA1ADORA2AADORA3ALDH1A1
SCHEMBL10017246 0.78 CYP2D6 (0.42) ALOX5ADORA1ADORA2AADORA3ALDH1A1
SCHEMBL16575393 0.77 ADORA3 (0.49) ADORA1ADORA3ALDH1A1MAPTSMN1; SMN2
SCHEMBL16575397 0.77 ADORA3 (0.43) ADORA1ADORA2AADORA3ALDH1A1MAPT
SCHEMBL29290124 0.75 ALDH1A1 (0.49) ADORA1ADORA2AADORA3ALDH1A1MAPT
SCHEMBL28379581 0.75 ALDH1A1 (0.42) ALOX5ADORA1ADORA2AADORA3ALDH1A1
SCHEMBL203121 0.74 ADRB2 (0.61) ADORA1ADORA2AADORA3ALDH1A1MAPT
SCHEMBL30662422 0.73 SMN1; SMN2 (0.57) ALDH1A1MAPTSMN1; SMN2L3MBTL1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114730127-B Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter 东丽株式会社 2023-05-12 — — CN disclosed
CN-110891980-B Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2022-09-30 — — CN disclosed
CN-114730127-A Photosensitive resin composition, photosensitive resin sheet, hollow structure, cured product, method for producing hollow structure, electronic component, and elastic wave filter 东丽株式会社 2022-07-08 — — CN disclosed
CN-107407871-B Photosensitive resin composition, photosensitive resin composition film, cured product, insulating film, and multilayer wiring board 东丽株式会社 2021-09-03 — — CN disclosed
CN-110891980-A Radical polymerization control agent and radical polymerization control method 川崎化成工业株式会社 2020-03-17 — — CN disclosed
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