SCHEMBL28401460

SCHEMBL28401460

CCCC(=O)OC(=O)Oc1cccc(C)c1

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.54
GAA P10253 2/20 0.47
ACHE P22303 1/20 0.47
KMT2A Q03164 6/20 0.45
KDM4E B2RXH2 2/20 0.45
MEN1 O00255 1/20 0.45
CRHBP P24387 1/20 0.45
CRHR2 Q13324 1/20 0.45
HPGD P15428 1/20 0.44
KLK7 P49862 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
ALDH1A1 P00352 2/20 0.43
GLA P06280 1/20 0.43
MAPT P10636 1/20 0.43
ALOX15 P16050 1/20 0.42
MAPK1 P28482 1/20 0.42
HSD17B10 Q99714 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4810160 0.89 LMNA (0.62) LMNAGAAACHEKMT2AKDM4E
SCHEMBL27597476 0.82 ALDH1A1 (0.48) LMNAKMT2AKDM4EMEN1HPGD
SCHEMBL11708911 0.82 LMNA (0.67) LMNAGAAACHEKMT2AKDM4E
SCHEMBL421378 0.80 BCL9 (0.53) LMNAGAAACHEKMT2AKDM4E
SCHEMBL29418226 0.80 LMNA (0.74) LMNAGAAACHEKMT2AMEN1
SCHEMBL819332 0.80 LMNA (0.74) LMNAGAAACHEKMT2AMEN1
SCHEMBL572371 0.80 LMNA (0.59) LMNAGAAACHEKMT2AKDM4E
SCHEMBL308933 0.79 LMNA (0.62) LMNAGAAACHEKMT2AKDM4E
Propionic Acid SCHEMBL27681905 0.78 LMNA (0.61) LMNAGAAACHEKMT2AKDM4E
SCHEMBL7980728 0.77 LMNA (0.65) LMNAGAAACHEKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 CN disclosed