Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.51 |
| ▸ | DGKA | P23743 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | PAM | P19021 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | CES2 | O00748 | 4/20 | 0.40 |
| ▸ | CES1 | P23141 | 4/20 | 0.40 |
| ▸ | TK1 | P04183 | 1/20 | 0.40 |
| ▸ | FAAH | O00519 | 1/20 | 0.40 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.39 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | POLA1 | P09884 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28173939 | 0.98 | TSHR (0.54) | TSHRDGKALMNAPAMMAPT | |
| SCHEMBL27685839 | 0.96 | TSHR (0.53) | TSHRDGKALMNAPAMMAPT | |
| SCHEMBL28137672 | 0.94 | TSHR (0.44) | TSHRDGKALMNAPAMMAPT | |
| SCHEMBL27691616 | 0.90 | ALDH1A1 (0.39) | TSHRDGKALMNAMAPTTK1 | |
| SCHEMBL28213970 | 0.88 | LMNA (0.42) | TSHRDGKALMNAPAMMAPT | |
| SCHEMBL515679 | 0.84 | DGKA (0.56) | TSHRDGKALMNAPAMMAPT | |
| SCHEMBL515678 | 0.84 | DGKA (0.56) | TSHRDGKALMNAPAMMAPT | |
| SCHEMBL28085041 | 0.84 | FASN (0.45) | TSHRLMNAMAPTFAAHPOLB | |
| SCHEMBL37988 | 0.82 | DGKA (0.59) | TSHRDGKALMNAPAMMAPT | |
| SCHEMBL11553304 | 0.82 | DGKA (0.59) | TSHRDGKALMNAPAMMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111240156-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-06-05 | — | — | CN | disclosed |