SCHEMBL28412396

SCHEMBL28412396

[CH2]C(OCC)OC(=O)NCCC

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.39
CHRNB4 P30926 1/20 0.39
CHRNA3 P32297 1/20 0.39
CHRNA4 P43681 1/20 0.39
BCHE P06276 1/20 0.37
ACHE P22303 8/20 0.36
EPHX1 P07099 2/20 0.36
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
L3MBTL1 Q9Y468 2/20 0.35
MMP1 P03956 1/20 0.34
MMP2 P08253 1/20 0.34
MMP3 P08254 1/20 0.34
MMP9 P14780 1/20 0.34
ALDH1A1 P00352 1/20 0.33
MAPT P10636 1/20 0.33
ATM Q13315 1/20 0.33
MCL1 Q07820 1/20 0.32
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28413876 0.89 ACHE (0.50) ACHEEPHX1ALOX15
SCHEMBL28409892 0.85 CHRNB2 (0.36) CHRNB2CHRNB4CHRNA3CHRNA4EPHX1
SCHEMBL28407609 0.79 EPHX1 (0.34) CHRNB2CHRNA4EPHX1
SCHEMBL104010 0.74 ALOX15 (0.50) CHRNB2CHRNB4CHRNA3CHRNA4BCHE
SCHEMBL27603548 0.74 CHRNB2 (0.44) CHRNB2CHRNB4CHRNA3CHRNA4BCHE
SCHEMBL5985590 0.72 CHRNB2 (0.43) CHRNB2CHRNB4CHRNA3CHRNA4BCHE
SCHEMBL11752273 0.72 CHRNB2 (0.47) CHRNB2CHRNB4CHRNA3CHRNA4BCHE
SCHEMBL27754881 0.72 CHRNB2 (0.44) CHRNB2CHRNB4CHRNA3CHRNA4BCHE
SCHEMBL216509 0.71
SCHEMBL17790871 0.71 MAPT (0.44) CHRNB2CHRNB4CHRNA3CHRNA4BCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116218282-A Radiation curable inkjet composition and inkjet recording apparatus 精工爱普生株式会社 2023-06-06 CN disclosed
CN-113444397-A Radiation-curable inkjet composition and inkjet method 精工爱普生株式会社 2021-09-28 CN disclosed
CN-111117338-A Radiation-curable ink composition and recording method 精工爱普生株式会社 2020-05-08 CN disclosed