⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19619432 | 0.86 | — | — | |
| SCHEMBL454651 | 0.82 | THRB (0.30) | — | |
| SCHEMBL5917762 | 0.81 | ATM (0.48) | — | |
| SCHEMBL36328 | 0.81 | TSHR (0.33) | — | |
| SCHEMBL7036978 | 0.81 | — | — | |
| SCHEMBL451377 | 0.80 | ALDH1A1 (0.31) | — | |
| SCHEMBL30185994 | 0.79 | — | — | |
| SCHEMBL3953939 | 0.79 | THRB (0.32) | — | |
| SCHEMBL21247654 | 0.78 | MEN1 (0.33) | — | |
| SCHEMBL450766 | 0.77 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 521 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250013149-A1 | ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND APPLICATION OF ADDITIVE | CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) | 2025-01-09 | — | — | US | claimed |
| CN-115963691-A | Additive for ArF immersion photoresist and photoresist containing additive | 上海芯刻微材料技术有限责任公司 | 2023-04-14 | — | — | CN | claimed |
| CN-112175133-B | Acrylic resin and preparation method and application thereof | 宁波南大光电材料有限公司 | 2022-08-19 | — | — | CN | claimed |
| CN-110770282-A | Curable silicone composition, and application and use thereof | 莫门蒂夫性能材料股份有限公司 | 2020-02-07 | — | — | CN | claimed |
| US-20030235777-A1 | Mixing resin obtained by polymerizing 1-vinyl-3-esterphenyl compound with one or more monomers and treating the polymer to provide meta-hydroxyphenyl repeat units with photoactive component | SHIPLEY COMPANY, L.L.C. | 2003-12-25 | — | — | US | claimed |
| US-20030139613-A1 | Process for preparing acrylate compound | TOSOH CORPORATION | 2003-07-24 | — | — | US | claimed |
| EP-4702010-A1 | PHOTOACTIVE COMPOUNDS | Merck Patent GmbH (DE) | 2026-03-04 | — | — | EP | disclosed |
| US-12234369-B2 | Photoresist topcoat compositions and methods of processing photoresist compositions | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-02-25 | — | — | US | disclosed |
| US-12228859-B2 | Pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2025-02-18 | — | — | US | disclosed |
| US-20250013149-A1 | ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND APPLICATION OF ADDITIVE | CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) | 2025-01-09 | — | — | US | disclosed |
| CN-112285998-B | Method for forming pattern using antireflective coating composition comprising photoacid generator | 罗门哈斯电子材料有限责任公司 | 2025-01-03 | — | — | CN | disclosed |
| US-20240392146-A1 | RESIN, ACTIVE ENERGY RAY-CURABLE COMPOSITION, ACTIVE ENERGY RAY-CURABLE INK, OVERCOAT VARNISH, PAINT, ADHESIVE, PHOTORESIST, AND METHOD FOR PRODUCING PRINTED MATTER | TORAY INDUSTRIES, INC. (JP) | 2024-11-28 | — | — | US | disclosed |
| WO-2024223739-A1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2024-10-31 | — | — | WO | disclosed |
| US-20020051932-A1 | Photoresists for imaging with high energy radiation | SHIPLEY COMPANY, L.L.C. | 2002-05-02 | — | — | US | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |
| WO-2002017019-A2 | OXIME SULFONATE AND N-OXYIMIDOSULFONATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-02-28 | — | — | WO | disclosed |
| US-20020009663-A1 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2002-01-24 | — | — | US | disclosed |
| WO-2001086353-A1 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2001-11-15 | — | — | WO | disclosed |
| US-6306554-B1 | PHOTORESIST COMPOSITION COMPRISING PHOTOACTIVE COMPONENT AND POLYMER THAT COMPRISES A PHOTOACID-LABILE MOIETY AND STRUCTURE CONTAINING OXYGEN AND/OR SULFUR ALICYCLIC UNITS AND CARBON ALICYCLIC UNITS | SHIPLEY COMPANY, L.L.C. | 2001-10-23 | — | — | US | disclosed |
| WO-2001063363-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2001-08-30 | — | — | WO | disclosed |