Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 2/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30185994 | 0.84 | — | — | |
| SCHEMBL284285 | 0.82 | — | — | |
| SCHEMBL7036978 | 0.82 | — | — | |
| SCHEMBL3953939 | 0.81 | THRB (0.32) | THRBCYP2C9 | |
| SCHEMBL19619432 | 0.81 | — | — | |
| SCHEMBL21247654 | 0.79 | MEN1 (0.33) | THRBALDH1A1 | |
| SCHEMBL451377 | 0.78 | ALDH1A1 (0.31) | THRBALDH1A1LMNAHTTSMN1; SMN2 | |
| SCHEMBL3858084 | 0.78 | DPP4 (0.30) | — | |
| SCHEMBL7185948 | 0.76 | — | — | |
| SCHEMBL108706 | 0.75 | ALDH1A1 (0.33) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1551887-A4 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2008-07-02 | — | — | EP | claimed |
| US-20050203262-A1 | Fluorinated polymers, photoresists and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-09-15 | — | — | US | claimed |
| EP-1551887-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E. I. du Pont de Nemours and Company (US) | 2005-07-13 | — | — | EP | claimed |
| WO-2004011509-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-02-05 | — | — | WO | claimed |
| US-12264073-B2 | Composite material | ADEKA CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| CN-117924568-A | High refractive index encapsulation composition and application thereof | 武汉柔显科技股份有限公司 | 2024-04-26 | — | — | CN | disclosed |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| WO-2023190605-A1 | COMPOSITE MATERIAL AND METHOD FOR PRODUCING SAME, AND CROSSLINKING AGENT | 国立大学法人大阪大学 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023171709-A1 | RESIN COMPOSITION AND METHOD FOR PRODUCING SAME | 国立大学法人大阪大学 | 2023-09-14 | — | — | WO | disclosed |
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-03-07 | — | — | US | disclosed |
| WO-2023003043-A1 | SILICONE-BASED POLYMER COMPOUND AND SILICONE-BASED POLYMER MATERIAL | 国立大学法人大阪大学 | 2023-01-26 | — | — | WO | disclosed |
| US-20030149225-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6541597-B2 | Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020132181-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-09-19 | — | — | US | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| EP-1225480-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-1085003-A1 | HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-0936504-A1 | A radiation-sensitive material and a method for forming a pattern therewith | Daicel Chemical Industries, Ltd. (JP) | 1999-08-18 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11597696-B2 | Method for purifying polymerizable fluoromonomer by distillation | AFF1, AFF4, AFF2 | THRB 1246/4885ALDH1A1 950/4885LMNA 1385/4885 |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | PFAS, AFF2, AFF1 | THRB 2068/4885ALDH1A1 865/4885LMNA 2606/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.