SCHEMBL28447709

SCHEMBL28447709

C=C(Oc1ccc(N)cc1)C(C)(C)[SiH3]

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.41
MAPT P10636 4/20 0.41
MAPK1 P28482 2/20 0.41
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
HPGD P15428 1/20 0.41
TDP1 Q9NUW8 6/20 0.40
CYP3A4 P08684 2/20 0.39
TSHR P16473 2/20 0.38
TEAD4 Q15561 1/20 0.36
NR1H4 Q96RI1 1/20 0.36
POLB P06746 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
KDM4E B2RXH2 1/20 0.34
GLA P06280 1/20 0.34
GAA P10253 1/20 0.34
THRB P10828 1/20 0.34
BLM P54132 1/20 0.34
CASP6 P55212 1/20 0.34
GFER P55789 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20036375 0.73 TDP1 (0.48) ALDH1A1MAPTMAPK1NPC1RAB9A
SCHEMBL8975663 0.70 TDP1 (0.48) ALDH1A1MAPTMAPK1NPC1RAB9A
SCHEMBL6668735 0.68 ELANE (0.70) MAPTTDP1NR1H4KDM4EGLA
SCHEMBL1263025 0.67 ELANE (0.59) ALDH1A1MAPTMAPK1RAB9ATDP1
SCHEMBL3308809 0.67 ELANE (0.52) ALDH1A1MAPTMAPK1NPC1RAB9A
Ethylene SCHEMBL4257350 0.65 LMNA (0.59) ALDH1A1MAPTMAPK1TDP1CYP3A4
SCHEMBL2767801 0.65 TDP1 (0.44) ALDH1A1MAPTMAPK1NPC1RAB9A
SCHEMBL2366870 0.65 ELANE (0.68) ALDH1A1MAPTMAPK1NPC1RAB9A
SCHEMBL6141125 0.64 ALDH1A1 (0.48) ALDH1A1MAPTMAPK1NPC1RAB9A
SCHEMBL222240 0.64 LMNA (0.64) ALDH1A1MAPTMAPK1TDP1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110099974-B Composition for forming protective layer on substrate 日产化学株式会社 2022-02-25 CN disclosed
CN-111423813-B Composition for forming release layer and release layer 日产化学工业株式会社 2021-11-23 CN disclosed
CN-107406675-B Composition for forming release layer and release layer 日产化学工业株式会社 2020-11-06 CN disclosed
CN-111423813-A Composition for forming release layer and release layer 日产化学工业株式会社 2020-07-17 CN disclosed