SCHEMBL284553

SCHEMBL284553

CCc1cccc2[nH]nnc12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.39
GABRB2 P47870 4/20 0.39
DAO P14920 1/20 0.37
DDO Q99489 1/20 0.37
TAAR1 Q96RJ0 2/20 0.34
HTR1A P08908 1/20 0.34
NPEPPS P55786 1/20 0.34
TRPA1 O75762 1/20 0.33
ATP4A P20648 1/20 0.33
ATP4B P51164 1/20 0.33
GRM4 Q14833 1/20 0.33
TLR8 Q9NR97 1/20 0.33
GAA P10253 1/20 0.33
MAPT P10636 2/20 0.33
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
PDK2 Q15119 1/20 0.33
ELANE P08246 1/20 0.32
MEN1 O00255 1/20 0.32
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29466093 1.00 GABRA1 (0.39) GABRA1GABRB2DAODDOTAAR1
SCHEMBL27708691 0.98 GABRA1 (0.38) GABRA1GABRB2DAODDOTAAR1
SCHEMBL9637484 0.98 GABRA1 (0.38) GABRA1GABRB2DAODDOTAAR1
Acetic Acid SCHEMBL28596667 0.92 GABRA1 (0.37) GABRA1GABRB2DAODDOGAA
SCHEMBL29410054 0.85 DAO (0.33) DAOHTR1AELANEKMT2A
SCHEMBL5703184 0.85 DAO (0.33) DAOHTR1AELANEKMT2A
SCHEMBL28799243 0.84 TRPA1 (0.41) GABRA1GABRB2DAODDONPEPPS
SCHEMBL29696957 0.84 GPR84 (0.32) MAPTMEN1KMT2A
SCHEMBL9186966 0.84
SCHEMBL449004 0.84 GPR84 (0.32) MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1365 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12630744-B2 Polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2026-05-19 US claimed
CN-121573828-A Scale inhibitor suitable for high-chlorine high-calcium magnesium water quality and preparation method and application thereof 成都北方石油勘探开发技术有限公司 2026-02-27 CN claimed
EP-4653506-A1 CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A, Inc. (US) 2025-11-26 EP claimed
US-20250333622-A1 POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM ELECTRONIC MAT USA INC (US) 2025-10-30 US claimed
US-20250320438-A1 Wet Etch Formulations for Semiconductor Processing M-R Advanced Technologies, LLC (US) 2025-10-16 US claimed
EP-4626996-A1 POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A, Inc. (US) 2025-10-08 EP claimed
EP-3774680-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2025-09-24 EP claimed
US-12398291-B2 Polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-08-26 US claimed
US-12371589-B2 Polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-07-29 US claimed
CN-119955483-A Automobile coolant for hydrogen fuel cell 中国石油天然气股份有限公司 2025-05-09 CN claimed
EP-1051888-B1 PROCESS AND SOLUTION FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES ATOTECH DEUTSCHLAND GMBH (DE) 2002-03-27 EP claimed
EP-1055355-B1 PROCESS FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES ATOTECH DEUTSCHLAND GMBH (DE) 2001-12-05 EP claimed
EP-1055355-A1 PROCESS FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES ATOTECH Deutschland GmbH (DE) 2000-11-29 EP claimed
EP-1051888-A1 PROCESS AND SOLUTION FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES ATOTECH Deutschland GmbH (DE) 2000-11-15 EP claimed
US-6022937-A Polyether polyols based on triazole group containing compounds and a process for their production BAYER CORPORATION (US) 2000-02-08 US claimed
WO-1999040765-A1 PROCESS FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES ATOTECH DEUTSCHLAND GMBH (DE) 1999-08-12 WO claimed
WO-1999040764-A1 PROCESS AND SOLUTION FOR THE PRELIMINARY TREATMENT OF COPPER SURFACES ATOTECH DEUTSCHLAND GMBH (DE) 1999-08-12 WO claimed
EP-0132765-B1 METAL CLEANING COMPOSITIONS Kao Corporation (JP) 1988-04-20 EP claimed
US-4595519-A Nonionic surfactant, carboxylic acid or salt, heterocyclic ring compound containing sulfur or nitrogen KAO CORPORATION (JP) 1986-06-17 US claimed
EP-0132765-A1 Metal cleaning compositions Kao Corporation (JP) 1985-02-13 EP claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12630744-B2 Polishing compositions and methods of use thereof ZAP70, PRKDC, PEAK1 GABRA1 3199/4885GABRB2 3453/4885DAO 1861/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.