SCHEMBL9637484

SCHEMBL9637484

CCc1cccc2[nH]nnc12.[Ag]

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.38
GABRB2 P47870 4/20 0.38
DAO P14920 1/20 0.36
DDO Q99489 1/20 0.36
TAAR1 Q96RJ0 2/20 0.33
HTR1A P08908 1/20 0.33
NPEPPS P55786 1/20 0.33
TRPA1 O75762 1/20 0.33
ATP4A P20648 1/20 0.32
ATP4B P51164 1/20 0.32
GRM4 Q14833 1/20 0.32
TLR8 Q9NR97 1/20 0.32
GAA P10253 1/20 0.32
MAPT P10636 2/20 0.32
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.32
PDK2 Q15119 1/20 0.32
ELANE P08246 1/20 0.31
MEN1 O00255 1/20 0.31
POLB P06746 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL284553 0.98 GABRA1 (0.39) GABRA1GABRB2DAODDOTAAR1
SCHEMBL29466093 0.98 GABRA1 (0.39) GABRA1GABRB2DAODDOTAAR1
SCHEMBL27708691 0.96 GABRA1 (0.38) GABRA1GABRB2DAODDOTAAR1
Acetic Acid SCHEMBL28596667 0.90 GABRA1 (0.37) GABRA1GABRB2DAODDOGAA
SCHEMBL29410054 0.84 DAO (0.33) DAOHTR1AELANEKMT2A
SCHEMBL5703184 0.84 DAO (0.33) DAOHTR1AELANEKMT2A
SCHEMBL28799243 0.83 TRPA1 (0.41) GABRA1GABRB2DAODDONPEPPS
SCHEMBL29696957 0.82 GPR84 (0.32) MAPTMEN1KMT2A
SCHEMBL9186966 0.82
SCHEMBL449004 0.82 GPR84 (0.32) MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101130549-A Antimicrobial NIPPON CHEMICAL INDUSTRY CO LT (JP) 2008-02-27 CN disclosed
EP-0256820-B1 THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1992-07-29 EP disclosed
US-5032499-A High density, stability KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-07-16 US disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed