SCHEMBL284744

SCHEMBL284744

c1ccc(CN(c2ccccc2)c2cccc3ccccc23)cc1

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 6/20 0.44
L3MBTL1 Q9Y468 1/20 0.42
HTR1D P28221 1/20 0.41
HTR1B P28222 1/20 0.41
NR3C2 P08235 1/20 0.40
KMT2A Q03164 1/20 0.40
TSHR P16473 1/20 0.39
CFTR P13569 1/20 0.39
HDAC1 Q13547 1/20 0.38
HDAC8 Q9BY41 1/20 0.38
HDAC6 Q9UBN7 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C19 P33261 1/20 0.38
KCNA3 P22001 1/20 0.38
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18317458 0.92 L3MBTL1 (0.40) SIGMAR1L3MBTL1HTR1DHTR1BNR3C2
SCHEMBL18951584 0.88 SIGMAR1 (0.40) SIGMAR1L3MBTL1HTR1DHTR1BNR3C2
SCHEMBL24180869 0.88 SIGMAR1 (0.39) SIGMAR1L3MBTL1HTR1DHTR1BNR3C2
SCHEMBL14984196 0.86 RAB9A (0.46) SIGMAR1L3MBTL1HTR1DHTR1BKMT2A
SCHEMBL19649080 0.85 SIGMAR1 (0.38) SIGMAR1L3MBTL1HTR1DHTR1BNR3C2
SCHEMBL9446248 0.84 CYP1A2 (0.53) SIGMAR1L3MBTL1KMT2ATSHRCYP1A2
SCHEMBL28736829 0.83 KCNH2 (0.44) SIGMAR1L3MBTL1HTR1DHTR1BKMT2A
SCHEMBL2185816 0.80 APAF1 (0.49) SIGMAR1L3MBTL1NR3C2KMT2ATSHR
SCHEMBL29387399 0.80 APAF1 (0.49) SIGMAR1L3MBTL1NR3C2KMT2ATSHR
SCHEMBL20091255 0.80 CHKA (0.45) SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5529885-A AN ALKALI-SOLUBLE RESIN, A PHOTO ACID GENERATING SYSTEM AND A CROSSLINKING AGENT; STORAGE STABILITY; HIGH ASPECT RATIOS MITSUBISHI CHEMICAL CORPORATION (JP) 1996-06-25 US claimed
CN-105802709-A Preparation method for antioxidant gasoline engine lubricating oil 刘应才 2016-07-27 CN disclosed
CN-105802697-A Method for preparing modified plant-oil-based degradable methanol engine lubricating oil 刘应才 2016-07-27 CN disclosed
CN-103781888-B Biodegradable lubricating oil composition IDEMITSU KOSAN CO.,LTD. (JP) 2016-01-13 CN disclosed
CN-102421881-B Biodegradable lubricating oil composition IDEMITSU KOSAN CO.,LTD. (JP) 2015-10-21 CN disclosed
CN-102421882-B Biodegradable lubricating oil composition IDEMITSU KOSAN CO.,LTD. (JP) 2015-10-21 CN disclosed
US-9139795-B2 Biodegradable lubricant composition IDEMITSU KOSAN CO., LTD. (JP) 2015-09-22 US disclosed
EP-2428552-B1 BIODEGRADABLE LUBRICANT COMPOSITION IDEMITSU KOSAN CO (JP) 2015-07-01 EP disclosed
US-8987177-B2 Biodegradable lubricant composition IDEMITSU KOSAN CO., LTD. (JP) 2015-03-24 US disclosed
US-20140296117-A1 BIODEGRADABLE LUBRICATING OIL COMPOSITION IDEMITSU KOSAN CO., LTD. (JP) 2014-10-02 US disclosed
US-20120065111-A1 BIODEGRADABLE LUBRICANT COMPOSITION IDEMITSU KOSAN CO., LTD. (JP) 2012-03-15 US disclosed
EP-2428552-A1 BIODEGRADABLE LUBRICANT COMPOSITION Idemitsu Kosan Co., Ltd. (JP) 2012-03-14 EP disclosed
US-20120053098-A1 BIODEGRADABLE LUBRICANT COMPOSITION IDEMITSU KOSAN CO., LTD. (JP) 2012-03-01 US disclosed
US-20060210929-A1 Photosensitive composition and forming process of structured material using the composition CANON KABUSHIKI KAISHA (JP) 2006-09-21 US disclosed
WO-2005087901-A2 FUEL ADDITIVE COMPOSITION HAVING ANTIKNOCK PROPERTIES INNOSPEC LIMITED (GB) 2005-09-22 WO disclosed
US-5529885-A AN ALKALI-SOLUBLE RESIN, A PHOTO ACID GENERATING SYSTEM AND A CROSSLINKING AGENT; STORAGE STABILITY; HIGH ASPECT RATIOS MITSUBISHI CHEMICAL CORPORATION (JP) 1996-06-25 US disclosed
US-5395969-A Charge transport or control agents; photoconductors; electrographic toners ZENECA LIMITED (GB) 1995-03-07 US disclosed
US-5292614-A Bis(triaminotriazine) MITSUBISHI KASEI CORPORATION (JP) 1994-03-08 US disclosed
US-5286600-A Negative photosensitive composition and method for forming a resist pattern by means thereof MITSUBISHI KASEI CORPORATION (JP) 1994-02-15 US disclosed
US-5278315-A Phenylaminonaphthalyl hydrazone IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1994-01-11 US disclosed