Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.48 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.47 |
| ▸ | RXRA | P19793 | 3/20 | 0.46 |
| ▸ | NR1H2 | P55055 | 3/20 | 0.46 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.45 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.43 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.43 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.43 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.43 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.43 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.43 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.43 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.42 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12696315 | 0.89 | PLA2G4A (0.52) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL15504849 | 0.87 | PLA2G4A (0.54) | PSEN1PSEN2APH1BNCSTNAPH1A | |
| SCHEMBL5702452 | 0.87 | PSEN1 (0.49) | PTPN1PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL1586865 | 0.84 | LMNA (0.57) | PTPN1FFAR1 | |
| SCHEMBL2442541 | 0.84 | PPARA (0.53) | PTPN1PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL12696322 | 0.84 | PTPN1 (0.50) | PTPN1PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL1586600 | 0.83 | ADRB2 (0.54) | PTPN1FFAR1PSEN1PSEN2APH1B | |
| SCHEMBL1586571 | 0.83 | ADRB2 (0.51) | HDAC8PTPN1FFAR1PSEN1PSEN2 | |
| SCHEMBL9325892 | 0.82 | PTPN1 (0.49) | PTPN1PSEN1PSEN2APH1BNCSTN | |
| SCHEMBL198467 | 0.82 | PTPN1 (0.60) | PTPN1PSEN1PSEN2APH1BNCSTN |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105301905-B | Chemically amplified positive resist composition and patterning method | 信越化学工业株式会社 | 2020-11-20 | — | — | CN | disclosed |