SCHEMBL28499025

SCHEMBL28499025

OCCc1ccc(O)c(-c2cccc3[nH]nnc23)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BACE1 P56817 3/20 0.41
MAPT P10636 3/20 0.41
GAA P10253 3/20 0.41
KDM4E B2RXH2 2/20 0.41
ALDH1A1 P00352 2/20 0.41
ALOX5 P09917 2/20 0.41
CNR1 P21554 2/20 0.40
CNR2 P34972 2/20 0.40
ACMSD Q8TDX5 1/20 0.34
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
ALDH2 P05091 1/20 0.33
GABRA1 P14867 1/20 0.33
AKR1B1 P15121 1/20 0.33
HPGD P15428 1/20 0.33
PPARG P37231 1/20 0.33
GABRB2 P47870 1/20 0.33
PPARD Q03181 1/20 0.33
PDK2 Q15119 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30567518 0.88 CNR1 (0.56) BACE1MAPTGAAKDM4EALDH1A1
SCHEMBL28309366 0.86 CNR1 (0.47) GAAALOX5CNR1CNR2NPSR1
SCHEMBL27388475 0.85 ENPP2 (0.36) BACE1MAPTGAAKDM4EALDH1A1
SCHEMBL8101394 0.85 CNR1 (0.46) CNR1CNR2
SCHEMBL29199073 0.84 CNR1 (0.44) CNR1CNR2
SCHEMBL2802977 0.84 CNR1 (0.44) CNR1CNR2
SCHEMBL2730924 0.82 GABRA1 (0.57) MAPTGAAKDM4EALDH1A1ALOX5
SCHEMBL4656386 0.81 GABRA1 (0.39) MAPTGAAKDM4EALDH1A1ALOX5
SCHEMBL11880583 0.80 GAA (0.46) MAPTGAAALDH1A1MEN1KMT2A
SCHEMBL6851614 0.79 APP (0.39) MAPTGAAKDM4EALDH1A1ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112055728-A Particulate stabilizer composition for polymer resins and process for producing the same 塞特工业公司 2020-12-08 CN claimed
WO-2025099143-A1 COMPOSITIONS FOR STABILIZING POLYMERIC MATERIALS AGAINST UV LIGHT THERMAL AND GAS FADING DEGRADATION CYTEC INDUSTRIES INC. (US) 2025-05-15 WO disclosed
WO-2025099141-A1 STABILIZING COMPOSITIONS FOR POLYMERIC MATERIALS CYTEC INDUSTRIES INC. (US) 2025-05-15 WO disclosed
CN-112055728-B Granular stabilizer composition for polymer resin and method for producing the same 塞特工业公司 2023-05-05 CN disclosed
CN-115368629-A Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same 塞特工业公司 2022-11-22 CN disclosed
CN-113597416-A Shaped synthetic polymer article 巴斯夫欧洲公司 2021-11-02 CN disclosed
CN-112055728-A Particulate stabilizer composition for polymer resins and process for producing the same 塞特工业公司 2020-12-08 CN disclosed
CN-111116982-A Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same 塞特工业公司 2020-05-08 CN disclosed